6533b7d2fe1ef96bd125f688

RESEARCH PRODUCT

Electrochemical Deposition Mechanism for ZnO Nanorods: Diffusion Coefficient and Growth Models

R. CamarattaA. N. C. LimaM. D. Reyes TolosaM. PascualJavier Orozco-messanaM.a. Hernández-fenollosa

subject

INGENIERIA DE LA CONSTRUCCIONMaterials scienceThin-FilmsDiffusionZinc-OxideInorganic chemistrychemistry.chemical_elementZincElectrochemistryCIENCIA DE LOS MATERIALES E INGENIERIA METALURGICAMaterials ChemistryElectrochemistryDeposition (phase transition)Thin filmRenewable Energy Sustainability and the Environmentbusiness.industryOptical-PropertiesCondensed Matter PhysicsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsSemiconductorchemistrySemiconductorsFISICA APLICADACathodic ElectrodepositionNanorodbusiness

description

Fabrication of nanostructured ZnO thin films is a critical process for many applications based on semiconductor devices. So on understanding of the electrochemical deposition mechanism is also fundamental for knowing the optimal conditions on growth of ZnO nanorods by electrodeposition. In this paper the electrochemical mechanism for ZnO nanorods formation is studied. Results are based on the evolution of the diffusion coefficient using the Cotrell equation, and different growth models proposed by Scharifcker and Hills for nucleation and growth.

yearjournalcountryeditionlanguage
2011-01-01
10.1149/0.020111jeshttp://hdl.handle.net/10251/31973