0000000000201318
AUTHOR
Filipe Vaz
Development of dark Ti(C,O,N) coatings prepared by reactive sputtering
Accepted manuscript
Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin films
The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro- Raman spectroscopy, but it was not the only effect associated to the increase of the O2+N2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitro…
Growth and size distribution of Au nanoparticles in annealed Au/TiO2 thin films
Abstract Nanocomposites consisting of noble metal nanoparticles (NPs) embedded in TiO2 thin films are of great interest for applications in optoelectronics, photocatalysis and solar-cells for which the plasmonic properties of the metal NPs play a major role. This work investigates the first stages of the formation of gold NPs by thermal annealing of Au-doped TiO2 thin films grown by magnetron sputtering. A low concentration of gold in the films is considered (5 at.%) in order to study the first stages of the formation of the NPs. Raman spectroscopy is used to follow the crystallization of TiO2 when increasing the annealing temperature. In addition, low-frequency Raman scattering (LFRS) is u…
Influence of the composition of titanium oxynitride layers on the fretting behavior of functionalized titanium substrates: PVD films versus surface laser treatments
International audience; Abstract In this work we compared the fretting behavior of pure titanium plates functionalized with titanium oxynitride surface layers, obtained by two methods: a Physical Vapor Deposition (PVD) method, reactive magnetron sputtering, and Surface Laser Treatments (SLT), under different mixtures of oxygen and nitrogen. The composition of the layers was determined by nuclear reaction analysis (NRA) and their structure was analyzed by Raman spectroscopy. PVD layers were TiN-like fcc layers, with an oxygen concentration going from 36 to 50 at.%. Three SLT layers were studied. The first one was a TiN-like layer containing ~28 at.% of oxygen. The second one was formed of di…