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RESEARCH PRODUCT
Structure and chemical bonds in reactively sputtered black Ti–C–N–O thin films
Luc ImhoffJean-françois PiersonM.c. Marco De LucasOlivier HeintzC. MouraValérie PotinSylvie BourgeoisFilipe VazJ.m. ChappéLuís Miguel Cunhasubject
Materials sciencePhotoemission spectroscopyReactive sputteringAnalytical chemistrychemistry.chemical_element02 engineering and technology01 natural sciencesElectron spectroscopyX-ray photoelectron spectroscopy0103 physical sciencesMaterials Chemistry010302 applied physicsTitanium oxy-carbo-nitridesScience & TechnologyMetals and AlloysSurfaces and InterfacesPartial pressure021001 nanoscience & nanotechnologyX-ray photoelectron SpectroscopyTransmission electron Microscopy3. Good healthSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCarbon filmAmorphous carbonchemistryRaman spectroscopy0210 nano-technologyCarbonTitaniumdescription
The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro- Raman spectroscopy, but it was not the only effect associated to the increase of the O2+N2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitrogen than to carbon. This gives rise to the appearance of amorphous carbon coexisting with poorly crystallized titanium oxynitride. The evolution of the films colour is explained on the basis of these structural changes.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2011-10-31 |