0000000000273619
AUTHOR
K. Grzelakowski
Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity
Abstract With the improved access to synchrotron radiation sources photoemission electron microscopy is developing into a versatile analytical tool in surface and materials science. The broad spectral range and the well-defined polarization characteristics of synchrotron light permit a unique combination of topographic, chemical, and even magnetic investigations down to a mesoscopic scale. The potentiality of photoemission electron microscopy is demonstrated by several experiments on surfaces and microstructured thin film systems, which have been carried out with a newly designed instrument. We discuss its different modes of operation with respect to both microscopy and spectroscopy. A comb…
Fast elemental mapping and magnetic imaging with high lateral resolution using a novel photoemission microscope
Abstract Using tunable soft X-ray synchrotron radiation and a new-generation photoemission electron microscope with integral sample stage and microarea selector, elemental images and local XANES spectra have been measured. Given the present conditions (PM3 at BESSY), the lateral resolution was in the range of 130 nm with the potential of considerable improvement with high-brilliance sources (a base resolution of 25 nm was obtained in threshold photoemission). Measurements at the oxygen K-edge demonstrate that differences in the local chemical environment of the emitter atom are clearly revealed and can thus be used as a fingerprint technique for its chemical state and geometrical surroundin…