0000000000292079
AUTHOR
Hans-joachim Fitting
showing 7 related works from this author
Silicon dioxide thin film luminescence in comparison with bulk silica
1998
Abstract The luminescence of the self-trapped exciton (STE) in SiO2 films was measured at low temperatures on the background of defect luminescence under cathodoexcitation and compared with bulk silica luminescence. The defect luminescence is mainly caused by non-bridging oxygen centers (a red luminescence band at 1.8 eV) and twofold coordinated silicon centers (blue and ultraviolet luminescence with 2.7 and 4.4 eV bands, respectively). The STE luminescence with a band at 2.3 eV is uniformly distributed within SiO2 film volume. Contrary to defect luminescence, whose intensity increases with irradiation time, the STE luminescence decreases almost to zero in a few seconds of irradiation time.…
Cathodoluminescence study of undoped GaN films: Experiment and calculation
2009
Abstract In this paper, we report the theoretical and experimental results of cathodoluminescence (CL) from GaN layers grown at 800 °C by metal organic vapor phase epitaxy (MOVPE) on silicon substrate. The CL spectra recorded at room temperature reveal the near band-edge emission at 3.35–3.42 eV and a broad yellow luminescence at 2.2 eV. The CL depth analysis at constant power excitation shows inhomogeneous CL distribution in depth of these emissions as the electron beam increases from 3 to 25 keV. There appears a blue shift of the CL band-edge peaks with increasing sample depth. This behavior is explained by a change of the fundamental band gap due to residual strain and the local temperat…
Investigation of optical and radiation properties of oxygen deficient silica glasses
1999
The deficiency of oxygen in pure silica manifests an absorption band at 5 eV as well as an absorption band of higher intensity at 7.6 eV. The band at 5 eV is associated with lone twofold-coordinated silicon centers. The nature of the main band at 7.6 eV has been studied using silica samples with different levels of oxygen deficiency. The excitation via the 7.6 eV band produces a photoelectric response as well as inner center and recombination type luminescence. Two main luminescence bands of the twofold-coordinated silicon center appear: a blue band (2.7 eV) and a UV band (4.4 eV). Induced absorption with several bands as well as thermally stimulated luminescence with complex peak structure…
Structure and luminescence of GaN layers
2001
Abstract GaN films grown on 〈1 1 1〉 Si substrate by means of low pressure MOCVD technique in a horizontal flow quartz reactor are characterized by different thin layer analysis methods. The polycrystalline hexagonal structure of the GaN layers has been checked by means of grazing incidence X-ray diffractometry and IR spectroscopy. Cathodoluminescence (CL) spectra and their time kinetics are studied. The mean decay time of the 3.44 eV UV bound exciton transition is below 1 ns, whereas the 3.26 eV violet band shows a slow hyperbolical decay over about 1 μs. A third yellow band appears at 2.12 eV due to transitions via localized states.
Cathodoluminescence of crystalline and amorphous SiO2 and GeO2
2001
Abstract Cathodoluminescence (CL) and its temperature-dose behaviour are presented for different crystalline and amorphous modifications of SiO 2 and GeO 2 as well as for Ge-doped SiO 2 layers. The crystalline samples include four-fold coordinated Si and Ge in hexagonal quartz and quartz-like crystals, respectively, as well six-fold coordinated atoms in tetragonal rutile-like crystals. The detected luminescence bands, in general, are attributed to three optical active luminescence centres: the two-fold coordinated silicon (=Si:) and germanium (=Ge:) centre, respectively, the non-bridging oxygen hole centre (NBOHC) and the self trapped exciton (STE). The first ones, the oxygen deficient cent…
Cathodoluminescence of Ge+, Si+, and O+ implanted SiO2 layers and the role of mobile oxygen in defect transformations
2002
Abstract Thermally grown SiO 2 layers of thickness d =500 nm have been implanted by Ge + , Si + , and O + ions of energy 350, 150, and 100 keV, respectively, and a uniform implantation dose of D i =5×10 16 ions/cm 2 . Thus the implantation profiles are expected with a concentration maximum of nearly 4 at.% at the half-depth d m ≅250 nm of the SiO 2 layers. After thermal annealing to 900 °C for 1 h in dry nitrogen or vacuum the typical violet luminescence band ( λ =400 nm) of the Ge + implanted centers is increased more than 200-fold and the Ge luminescent center depth profile is shifted from about 250 to 170 nm towards the surface as determined by cathodoluminescence (CL) depth profiling. I…
Cathodoluminescence and IR absorption of oxygen deficient silica – influence of hydrogen treatment
1999
Abstract The cathodoluminescence (CL) and IR absorption of silica samples with normal stoichiometry as well as with an extremely high level of oxygen deficit were studied. Additionally, some samples have been treated in hydrogen at 800°C. Crystalline quartz was used for reference measurements and the CL data have been compared with those of X-ray excited luminescence (XL). The luminescence spectra of silica have a band at 1.85 eV due to non-bridging oxygens and the two bands at 2.7 and 4.4 eV due to twofold-coordinated silicons. The energetic yield for CL is about 0.1%, for XL it approaches 0.15%. Cathodoluminescence of quartz at temperatures >130 K exhibits the self-trapped exciton lumines…