0000000000352220
AUTHOR
Nils Weber
Nanoelectron spectroscopy for chemical analysis: a novel energy filter for imaging x-ray photoemission spectroscopy
An ovel instrument for imaging ESCA is described. It is based on a tandem arrangement of two hemispherical energy analysers used as an imaging energy filter. The main spherical aberration (α 2 -term) of the analyser is corrected by the antisymmetry of the tandem configuration. The kinetic energy range useable for imaging extends up to 1.6 keV; this is compatible with Mg and Al Kα laboratory x-ray sources. First experiments on the chemical surface composition of a Cu0.98Bi0.02 polycrystal, a GaAs/AlGaAs heterostructure and Ag crystallites on Si(111) have been performed using synchrotron radiation. The results reveal an energy resolutio no f190 meV and a lateral resolution (edge resolution) o…
Quantitative microscopy of magnetic domains in Fe(100) by core-level x-ray photoelectron spectroscopy
We present an experimental technique for imaging of magnetic domain patterns based on element-specific core-level photoemission using polarized soft-x-ray radiation. It is applied to the measurement of domain patterns at the Fe(100) surface and at the surface of polycrystalline Fe. Different from well established imaging techniques that use a photoemission electron microscope to measure the secondary electron intensity at the Fe absorption threshold, we have investigated the photoemission intensity contrast on the the Fe $2{p}_{3∕2}$ core level using circularly polarized x-ray light. The linear and circular dichroism characteristics of the identical domain pattern are extracted by linear co…
Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy
A new method for the actinic at-wavelength inspection of defects inside and ontop of Extreme Ultraviolet Lithography (EUVL) multilayer-coated mask blanks is presented. The experimental technique is based on PhotoElectron Emission Microscopy (PEEM) supported by the generation of a standing wave field inside and above the multilayer mask blank when illuminated near the resonance Bragg wavelength at around 13.5 nm wavelength. Experimental results on programmed defect samples based on e-beam lithographic structures or PSL equivalent silica balls overcoated with an EUV multilayer show that buried defects scaling down to 50 nm in lateral size are detectable with further scalability down to 30 nm …