<title>Electrochromism in oxyfluoride thin films</title>

1994

Oxyfluoride films based on W and Ti were prepared by reactive sputtering in plasmas containing O2 + CF4. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction, high coloration efficiency, and good cycling durability.© (1994) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.