6533b835fe1ef96bd129fd56

RESEARCH PRODUCT

<title>Electrochromism in oxyfluoride thin films</title>

A. LusisB. A. StjernaJ. GabrusenoksA. GutarraAndris AzensClaes-goeran Granqvist

subject

ArgonMaterials sciencebusiness.industryInorganic chemistrychemistry.chemical_elementSputter depositionIonsymbols.namesakechemistryElectrochromismSputteringsymbolsOptoelectronicsLithiumThin filmRaman spectroscopybusiness

description

Oxyfluoride films based on W and Ti were prepared by reactive sputtering in plasmas containing O2 + CF4. The deposition rate was large, particularly when chemical sputtering was promoted by heating the target. The films could show large charge insertion/extraction, high coloration efficiency, and good cycling durability.© (1994) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

yearjournalcountryeditionlanguage
1994-09-09SPIE Proceedings
https://doi.org/10.1117/12.185386