6533b7d5fe1ef96bd12647cb

RESEARCH PRODUCT

Characterization of alpha sources prepared by direct evaporation using Rutherford backscattering spectrometry

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Abstract Standardization of solutions containing alpha emitting nuclides by direct evaporation onto metal supports is a widely used technique due to its simplicity in providing good quantitative results. In order to avoid inhomogeneity in the deposition surface, polished stainless steel disks and a spreading agent are generally used. These sources are usually measured by alpha spectrometry using passivated implanted silicon detectors. The resolution of the source is a measure of the thickness and homogeneity of the evaporated layer. Rutherford backscattering of He+ and H+ was here used to measure directly this thickness and homogeneity. The results were in agreement with semiconductor detector alpha spectrometry.