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RESEARCH PRODUCT
CVD elaboration and in situ characterization of barium silicate thin films.
Sylvie BourgeoisThomas GenevèsLuc ImhoffBruno DomenichiniPaul Maurice Peterlésubject
Materials scienceInorganic chemistrychemistry.chemical_element02 engineering and technologyChemical vapor deposition01 natural scienceschemistry.chemical_compound0103 physical sciencesMaterials ChemistryMetalorganic vapour phase epitaxyThin filmSpectroscopyFilms010302 applied physicsBarium oxideBariumSilicate021001 nanoscience & nanotechnologySilicateCarbon filmchemistryBariumCeramics and CompositesSublimation (phase transition)Insulator0210 nano-technologydescription
International audience; This study is concerned with the elaboration of barium silicate thin films by metal organic chemical vapor deposition (MOCVD) and in situ characterization by X-ray photoemission spectroscopy (XPS) with an apparatus connected to the deposition reactor. The difficulty to find an efficient metal organic precursor for barium is described. After characterizations of the selected reactant, Ba(TMHD)2tetraglyme, the development of an original specific vapor delivering source which allows reactant sublimation in the CVD reactor was performed. In the most optimized cases, including use of oxygen introduction during the deposition, barium silicate films were obtained. Moreover, non-negligible amounts of carbon and presence of barium oxide on the top of the layers were observed.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2010-01-01 |