6533b823fe1ef96bd127f74c

RESEARCH PRODUCT

Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

Graziella MalandrinoYana AleevaCristina SatrianoMaria Elena Fragalà

subject

Materials sciencezinc oxide; Nanowires and nanohole arrays; Colloidal lithographyMetals and AlloysNanowirezinc oxideNanotechnologyZnO; Catalyst; Nanowires; Nanohole array; Colloidal lithography; MOCVDSurfaces and InterfacesChemical vapor depositionSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCatalysisNanowireNanohole arrayScientific methodProcess integrationMOCVDMaterials ChemistryNanowires and nanohole arraysZnOColloidal lithographyMetalorganic vapour phase epitaxyCatalystThin filmLithography

description

A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.

yearjournalcountryeditionlanguage
2010-06-01
10.1016/j.tsf.2010.04.005http://hdl.handle.net/10447/97154