Search results for "MOCVD"

showing 10 items of 28 documents

Sb-implanted ZnO ultra-thin films

2017

Mild heating of the Zn(C5F6HO2)(2)center dot 2H(2)O center dot CH3(OCH2CH2)(2)OCH3 precursor allowed MOCVD deposition of ZnO films, in a low-pressure horizontal hot-wall reactor, on ITO substrates. The ZnO films were subsequently implanted with Sb ions. XRD measurements provided evidence that they consist of hexagonal, (002) and (101) oriented, crystals. UV-vis spectra showed that the transmittance of these films in the visible region is about 90%. The Sb implanted ZnO film showed a current-voltage characteristic that resembles that of a rectifying diode. This study represents the first example of Sb-implantation in ZnO films obtained by MOCVD.

AntimonyMaterials scienceCondensed Matter Physic02 engineering and technology010402 general chemistrySettore ING-INF/01 - Elettronica01 natural sciencesSettore FIS/03 - Fisica Della MateriaSpectral lineIonTransmittanceZnO filmDeposition (phase transition)Mechanics of MaterialGeneral Materials ScienceMetalorganic vapour phase epitaxyThin filmFilmDiodeDiodeHexagonal crystal systembusiness.industryMechanical Engineering021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesMechanics of MaterialsMOCVDZnOZnO film; antimony; diodeOptoelectronicsMaterials Science (all)0210 nano-technologybusinessMaterials Science in Semiconductor Processing
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Characterization of crystalline structure and morphology of Ga2O3 thin film grown by MOCVD technique

2017

Growth of gallium oxide thin film was realized with MOCVD on (0001) sapphire substrate. Structural and compositional properties of thin film were studied employing trimethylgallium and water as precursors, carrier gases were H2 and N2. Obtained film is polycrystalline and predominantly consisted of (201) oriented β-Ga2O3. Sample exhibited blue luminescence which is attributed to oxygen vacancies. H2 gas proved to have beneficial effect on film quality and overall growth process.

Gallium oxideSapphireCrystal structureMOCVD:NATURAL SCIENCES:Physics [Research Subject Categories]WaterTrimethylgallium
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Ultrathin and nanostructured ZnO-based films for fluorescence biosensing applications

2011

The fluorescence-based sensing capability of ultrathin ZnO-SiO(2) nanoplatforms, deposited by an integrated approach of colloidal lithography and metal organic chemical vapor deposition, has been investigated upon adsorption of fluorescein-labeled albumin, used as model analyte biomolecule. The protein immobilization process after spontaneous adsorption/desorption significantly enhances the green emission of the different ZnO-based films, as evidenced by scanning confocal microscopy, corresponding to a comparable protein coverage detected by X-ray photoelectron spectroscopy. Moreover, experiments of fluorescence recovery after photobleaching evidence that the protein lateral diffusion at th…

MOCVD–colloidal lithography; Protein adsorption; Fluorescence recovery after photobleachingMaterials scienceSilicon dioxideMOCVD-colloidal lithographyZnO thin film; MOCVD-colloidal lithography; Biosensing; Protein adsorption; Fluorescence recovery after photobleachingProtein adsorptionNanotechnologyBiointerfaceBiosensing TechniquesChemical vapor depositionFluorescenceFluorescence recovery after photobleachingBiomaterialschemistry.chemical_compoundColloid and Surface ChemistryAdsorptionX-ray photoelectron spectroscopyAlbuminschemistry.chemical_classificationBiosensingBiomoleculeMOCVD–colloidal lithographyMembranes ArtificialZnO thin filmSilicon DioxideNanostructuresSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialschemistryFluoresceinZinc OxideBiosensorProtein adsorptionJournal of Colloid and Interface Science
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Metallic interconnects for SOFC: Characterisation of corrosion resistance and conductivity evaluation at operating temperature of differently coated …

2007

Abstract One of challenges in improving the performance and cost-effectiveness of solid oxide fuel cells (SOFCs) is the development of suitable interconnect materials. Recent researches have enabled to decrease the operating temperature of the SOFC from 1000 to 800 °C. Chromia forming alloys are then among the best candidates for interconnects. However, low electronic conductivity and volatility of chromium oxide scale need to be solved to improve interconnect performances. In the field of high temperature oxidation of metals, it is well known that the addition of reactive element into alloys or as thin film coatings, improves their oxidation resistance at high temperature. The elements of …

Materials Chemistry2506 Metals and AlloysMaterials science020209 energyOxideEnergy Engineering and Power TechnologyMineralogychemistry.chemical_element02 engineering and technology[CHIM.INOR]Chemical Sciences/Inorganic chemistryengineering.materialCorrosionchemistry.chemical_compoundASROperating temperatureCoatingElectrochemistry0202 electrical engineering electronic engineering information engineeringSOFCElectrical and Electronic EngineeringPhysical and Theoretical ChemistryThin filmRenewable Energy Sustainability and the EnvironmentMetallurgyASR; Interconnect; MOCVD; Reactive element; SOFC; Electrochemistry; Fuel Technology; Materials Chemistry2506 Metals and Alloys; Energy (miscellaneous)[ CHIM.INOR ] Chemical Sciences/Inorganic chemistry[CHIM.MATE]Chemical Sciences/Material chemistryYttrium021001 nanoscience & nanotechnologyChromiaFuel Technologychemistry[ CHIM.MATE ] Chemical Sciences/Material chemistryInterconnectMOCVDengineeringSolid oxide fuel cell0210 nano-technologyReactive elementEnergy (miscellaneous)Journal of Power Sources
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Metallic interconnects for solid oxide fuel cell: Effect of water vapour on oxidation resistance of differently coated alloys

2009

International audience; The need of interconnect to separate fuel and oxidant gasses and connect individual cells into electrical series in a SOFC stack appears as one of the most important point in fuel cell technology. Due to their high electrical and thermal conductivities, thermal expansion compatibility with the other cell components and lowcost, ferritic stainless steels (FSS) are nowconsidered to be among the most promising candidate materials as interconnects in SOFC stacks. Despite the formation at 800 ◦C of a protective chromia Cr2O3 scale, it can transform in volatile chromium species, leading to the lost of its protectiveness and then the degradation of the fuel cell. A previous…

Materials science020209 energyEnergy Engineering and Power TechnologyMineralogy02 engineering and technologyChemical vapor deposition[CHIM.INOR]Chemical Sciences/Inorganic chemistryengineering.materialWater vapour7. Clean energyThermal expansionCorrosionCoating0202 electrical engineering electronic engineering information engineeringSOFCMetalorganic vapour phase epitaxyElectrical and Electronic EngineeringPhysical and Theoretical ChemistryRenewable Energy Sustainability and the Environment[ CHIM.INOR ] Chemical Sciences/Inorganic chemistry[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyChromiaAnodeChemical engineering[ CHIM.MATE ] Chemical Sciences/Material chemistryInterconnectMOCVDengineeringSolid oxide fuel cell0210 nano-technologyReactive elementJournal of Power Sources
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Faceting and structural anisotropy of nanopatterned CdO(110) layers

2005

CdO(110) layers with a self-organized surface structure have been grown on (10math0) sapphire (m plane) substrates by metal-organic vapor phase epitaxy. The epitaxial relationships between layer and substrate have been determined and a crystallographic model that accounts for the CdO in-plane orientation, which results in a reduced lattice mismatch when the CdO[001] direction is perpendicular to the sapphire c axis, has been proposed. Although the measured lattice parameters indicate that the layers are almost fully relaxed, an anisotropic mosaicity is detected with symmetrical rocking curves attaining minimum values when measured along the CdO[math10] direction. The layer morphology consis…

Materials scienceGeneral Physics and AstronomySemiconductor growthEpitaxyMosaicityVapour phase epitaxial growthCadmium compound ; Semiconductor epitaxial layers ; II-VI semiconductors ; Semiconductor growth ; Vapour phase epitaxial growth ; MOCVD ; Nanopatterning ; Self-assembly ; Lattice constants ; Mosaic structure ; Surface morphologyLattice constant:FÍSICA [UNESCO]PerpendicularMetalorganic vapour phase epitaxyAnisotropyCondensed matter physicsUNESCO::FÍSICASemiconductor epitaxial layersLattice constantsNanopatterningII-VI semiconductorsSelf-assemblyFacetingCrystallographyCadmium compoundMOCVDSapphireSurface morphologyMosaic structure
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Investigation of La2O3 and/or (Co,Mn)3O4 deposits on Crofer22APU for the SOFC interconnect application

2009

International audience; Chromia forming alloys (stainless steels) are among the best candidates for SOFC interconnects. However, problems of decreasing electronic conductivity during high temperature service and volatility of chromium oxide scales need to be solved. Electronically conductive surface coatings, which also reduce oxide scale growth and chromium volatility, are needed to improve stainless steel interconnects. The goal of this study is to investigate combinations of lanthanum oxide (La2O3) and cobalt manganese oxide ((Co,Mn)3O4) coatings on Crofer22APU stainless steel. Thin film coatings of La2O3 (~200 nm) and Co,Mn (1:1) (~2 mm) were deposited via metal organic chemical vapor d…

Materials scienceInterconnectsOxidechemistry.chemical_element02 engineering and technology[CHIM.INOR]Chemical Sciences/Inorganic chemistry010402 general chemistry01 natural sciencesChromiumchemistry.chemical_compoundLanthanum oxideCoatingsMaterials ChemistrySOFCThin filmMetallurgy[ CHIM.INOR ] Chemical Sciences/Inorganic chemistry[CHIM.MATE]Chemical Sciences/Material chemistrySurfaces and InterfacesGeneral ChemistrySputter deposition021001 nanoscience & nanotechnologyCondensed Matter PhysicsChromia0104 chemical sciencesSurfaces Coatings and FilmsPVDchemistry13. Climate actionPhysical vapor deposition[ CHIM.MATE ] Chemical Sciences/Material chemistryMOCVD0210 nano-technologyCobalt
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Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

2008

http://link.aip.org/link/?JAPIAU/103/056108/1

Materials sciencePhotoluminescenceSapphireSpectral line intensityCadmium compoundsIon platingAnalytical chemistryUNESCO::FÍSICASemiconductor epitaxial layersGeneral Physics and AstronomyII-VI semiconductorsEpitaxyAcceptorVapour phase epitaxial growthEtchingEtching (microfabrication):FÍSICA [UNESCO]Ion beam assisted depositionMOCVDSapphireCadmium compounds ; Etching ; II-VI semiconductors ; Impurities ; Ion beam assisted deposition ; MOCVD ; Photoluminescence ; Sapphire ; Semiconductor epitaxial layers ; Spectral line intensity ; Vapour phase epitaxial growthMetalorganic vapour phase epitaxyIon beam-assisted depositionPhotoluminescenceImpurities
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Chemical characterization of gallium droplets grown by LP-MOCVD.

2006

International audience; This study is concerned with the chemical characterization of metallic gallium droplets, obtained on silicon (1 0 0) substrates with a single growth step, by the LP-MOCVD technique with TMGa like precursor. These structures are characterized by SIMS, XPS and TEM. The analyses results lead to a structure proposition for the droplets. The core is composed of metastable metallic gallium with a non-negligible carbon quantity probably coming from incomplete precursor decomposition. The outer part, composed of gallium oxide maintains the structure stability. Covering of the substrate by a thin gallium layer of gallium compounds is observed.

Materials scienceSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technologySubstrate (electronics)Chemical vapor deposition010402 general chemistry01 natural sciencesX-ray photoelectron spectroscopyGallium dropletsXPSMetalorganic vapour phase epitaxyGalliumSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesSurfaces Coatings and FilmschemistryTransmission electron microscopyMOCVDTEM0210 nano-technologyLayer (electronics)SIMS
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Interfacial reaction during MOCVD growth revealed by in situ ARXPS.

2006

International audience; Angle-resolved X-ray photoelectron spectroscopy (ARXPS) experiments were performed to study in situ the reaction at the film–substrate interface during metal organic chemical vapor deposition (MOCVD) growth of TiO2 thin films deposited on the silicon substrate. The in-depth distribution of chemical species was determined using several ARXPS thickness calculation models considering either single or bilayer systems. By the comparison of two single-layermodels, the presence of a second layer composed of silicon oxidewas evidenced. High-resolution transmission electron microscopy (HRTEM) observations confirmed the stratification of the film in two layers, as well as the …

Materials scienceSiliconthickness measurementthin filmAnalytical chemistrychemistry.chemical_elementARXPS02 engineering and technologyChemical vapor deposition01 natural sciencesX-ray photoelectron spectroscopy0103 physical sciencesMaterials ChemistryTiO2Thin filmSilicon oxideHigh-resolution transmission electron microscopy010302 applied physicsBilayer[CHIM.MATE]Chemical Sciences/Material chemistrySurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmschemistry[ CHIM.MATE ] Chemical Sciences/Material chemistryMOCVDinterfaceWetting0210 nano-technology
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