Search results for "MOCVD"
showing 10 items of 28 documents
Résistance à la corrosion d'interconnecteurs métalliques de piles à combustibles de type SOFC : Influence de la vapeur d'eau
2008
Les interconnecteurs représentent une pièce maîtresse des piles à combustibles à oxyde solide (Solid Oxide Fuel Cells : SOFCs) car ils sont chargés de collecter et de délivrer le courant produit par la pile. Les matériaux d'interconnecteurs sont à la fois en contact avec l'anode et la cathode et doivent donc être parfaitement stables dans l'air (côté cathodique) et dans l'hydrogène enrichie en vapeur d'eau (côté anodique). Les matériaux métalliques les plus prometteurs sont les chromino-formeurs. Ces alliages sont choisis car, à haute température, ils forment une couche de chromine, Cr2O3, protectrice vis-à-vis des conditions corrosives de fonctionnement de la pile. Cependant, cette couche …
Metallic interconnects for solid oxide fuel cell: Effect of water vapour on oxidation resistance of differently coated alloys
2009
International audience; The need of interconnect to separate fuel and oxidant gasses and connect individual cells into electrical series in a SOFC stack appears as one of the most important point in fuel cell technology. Due to their high electrical and thermal conductivities, thermal expansion compatibility with the other cell components and lowcost, ferritic stainless steels (FSS) are nowconsidered to be among the most promising candidate materials as interconnects in SOFC stacks. Despite the formation at 800 ◦C of a protective chromia Cr2O3 scale, it can transform in volatile chromium species, leading to the lost of its protectiveness and then the degradation of the fuel cell. A previous…
Chemical characterization of gallium droplets grown by LP-MOCVD.
2006
International audience; This study is concerned with the chemical characterization of metallic gallium droplets, obtained on silicon (1 0 0) substrates with a single growth step, by the LP-MOCVD technique with TMGa like precursor. These structures are characterized by SIMS, XPS and TEM. The analyses results lead to a structure proposition for the droplets. The core is composed of metastable metallic gallium with a non-negligible carbon quantity probably coming from incomplete precursor decomposition. The outer part, composed of gallium oxide maintains the structure stability. Covering of the substrate by a thin gallium layer of gallium compounds is observed.
Characterization of crystalline structure and morphology of Ga2O3 thin film grown by MOCVD technique
2017
Growth of gallium oxide thin film was realized with MOCVD on (0001) sapphire substrate. Structural and compositional properties of thin film were studied employing trimethylgallium and water as precursors, carrier gases were H2 and N2. Obtained film is polycrystalline and predominantly consisted of (201) oriented β-Ga2O3. Sample exhibited blue luminescence which is attributed to oxygen vacancies. H2 gas proved to have beneficial effect on film quality and overall growth process.
Initial stages of metal oxides thin films growth by MOCVD: physicochemical characterisation of the film/substrate interface
2006
The initial stages of Metalorganic Chemical Vapour Deposition (MOCVD) of TiO2 thin films on Si(100) were studied in situ by surface analyses (XPS, ARXPS, AES). An original experimental set-up was built for this purpose and developed. Information obtained from these in situ experiments was completed by ex situ characterisations (HRTEM, SIMS, GIXRD...).The formation of an interfacial SiOy<2 layer resulting of the interaction of the precursor Ti(OCH(CH3)2)4 with the substrate takes place before the formation of stoichiometric TiO2 and leads to the presence of carbon at the interface. At the deposition temperature, 675 °C, silicon diffusion within the TiO2 external layer was also revealed. Conc…
Interconnecteurs métalliques de piles à combustible de type SOFC - Résistance à la corrosion et conductivité électrique à haute température
2009
The need of interconnect to connect individual cells into electrical series in a SOFC stack appears as one of the most important point in fuel cell technology. The main important criteria requires for interconnect is an excellent oxidation resistance in air and in H2/H2O. The goal of this study is to determine the influence on corrosion behaviour of a reactive element oxide coating (La2O3, Y2O3) realized by MOCVD on different metallic alloys like Crofer22APU, Haynes230 and Fe30Cr. The realisation of long ageing (7 700 and 15 400 hours) proved to be insightful. The corrosion kinetic experiments, the oxide scale characterisation and ASR measurements established that the presence of perovskite…
INTERCONNECTEURS METALLIQUES DE PILES A COMBUSTIBLES DE TYPE SOFC : EFFET DE LA VAPEUR D'EAU SUR LA RESISTANCE A LA CORROSION
2008
Les interconnecteurs représentent une pièce maîtresse des piles à combustibles à oxyde solide (Solid Oxide Fuel Cells : SOFCs) car ils sont chargés de collecter et de délivrer le courant produit par la pile. Les matériaux d'interconnecteurs sont à la fois en contact avec l'anode et la cathode et doivent donc être parfaitement stables dans l'air (côté cathodique) et dans l'hydrogène enrichie en vapeur d'eau (côté anodique). Les matériaux métalliques les plus prometteurs sont les chromino-formeurs. Ces alliages sont choisis car, à haute température, ils forment une couche de chromine, Cr2O3, protectrice vis-à-vis des conditions corrosives de fonctionnement de la pile. Cependant, cette couche …
Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays
2010
A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.
Correlation between Zn vacancies and photoluminescence emission in ZnO films.
2006
Photoluminescence and positron annihilation spectroscopy have been used to characterize and identify vacancy-type defects produced in ZnO films grown on sapphire by metal-organic chemical-vapor deposition. The photoluminescence of the samples in the near band edge region has been studied, paying particular attention to the emission at 370.5 nm (3.346 eV). This emission has been correlated to the concentration of Zn vacancies in the films, which has been determined by positron annihilation spectroscopy. Jesus.Zuniga@uv.es Vicente.Munoz@uv.es
Ultrathin and nanostructured ZnO-based films for fluorescence biosensing applications
2011
The fluorescence-based sensing capability of ultrathin ZnO-SiO(2) nanoplatforms, deposited by an integrated approach of colloidal lithography and metal organic chemical vapor deposition, has been investigated upon adsorption of fluorescein-labeled albumin, used as model analyte biomolecule. The protein immobilization process after spontaneous adsorption/desorption significantly enhances the green emission of the different ZnO-based films, as evidenced by scanning confocal microscopy, corresponding to a comparable protein coverage detected by X-ray photoelectron spectroscopy. Moreover, experiments of fluorescence recovery after photobleaching evidence that the protein lateral diffusion at th…