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RESEARCH PRODUCT

<title>Scanning probe microscopy of nanocrystalline iridium oxide thin films</title>

R. KalendarevD. TonneauAlexei KuzminD. PailhareyJuris PuransA. Houel

subject

Scanning probe microscopyMaterials scienceScanning confocal electron microscopyScanning ion-conductance microscopyNanotechnologyConductive atomic force microscopyScanning capacitance microscopyPhotoconductive atomic force microscopyVibrational analysis with scanning probe microscopyNanocrystalline material

description

Structural investigations of nanocrystalline iridium oxide thin films, prepared by dc magnetron sputtering technique were performed by scanning probe microscopy (SPM). SPM studies, using both atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), indicate that the thin films are composed of grains with a size of about 20-50 nm. Fine crystallinity and small RMS microroughness of the films, being well below 2 nm, make iridium oxide thin films promising candidates for nanolithographic applications. The possibility to perform nanolithograhpic processes at a scale of less than 150 nm was successfully examined in AFM and STM modes.© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

yearjournalcountryeditionlanguage
2003-08-08SPIE Proceedings
https://doi.org/10.1117/12.517031