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RESEARCH PRODUCT
Hydrogen influence on the structure and properties of amorphous hydrogenated carbon films deposited by direct ion beam
V. S. KulikauskasA. GrigonisI. ManikaM. Silinskassubject
HydrogenChemistryMetals and AlloysAnalytical chemistrychemistry.chemical_elementSurfaces and InterfacesRutherford backscattering spectrometrySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidElastic recoil detectionCondensed Matter::Materials ScienceIon beam depositionCarbon filmAmorphous carbonMaterials ChemistryPhysics::Atomic PhysicsThin filmdescription
Abstract The present work provides results for amorphous hydrogenated carbon (a-C:H) films grown by direct ion beam deposition method. Acetylene and its mixtures with hydrogen were used. The films were characterized by Rutherford backscattering spectrometry, elastic recoil detection, Raman spectroscopy, ellipsometry, infrared spectroscopy, and microhardness measurements. These techniques indicated that an admixture of hydrogen yields a lower deposition rate, a higher content of total and bounded hydrogen in the a-C:H films, and a lower film density. The optical and mechanical properties depend on both, hydrogen concentrations in the gas phase and in the films, and show a strong diamond-like component, which reaches maximum at 34 at.% of hydrogen. Further hydrogen dilution enhanced only sp 2 clustering and possible reduced a number of both sp 3 and C–C sp 3 bonds. We suppose that these effects (in the high hydrogen concentration range) are not only related to the ion irradiation difference between the light hydrogen and the much heavier carbon but also to the diffusion in the a-C:H films.
year | journal | country | edition | language |
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2008-02-01 | Thin Solid Films |