6533b855fe1ef96bd12b111e
RESEARCH PRODUCT
Superficial defects induced by argon and oxygen bombardments on (110) TiO2 surfaces
Sylvie BourgeoisEric LesniewskaS PétignyA SteinbrunnBruno DomenichiniH Mostéfa-sbasubject
ArgonOxidechemistry.chemical_elementSurfaces and InterfacesCondensed Matter PhysicsPhotochemistryOxygenSurfaces Coatings and FilmsMonocrystalline siliconCondensed Matter::Materials ScienceChemical statechemistry.chemical_compoundchemistryX-ray photoelectron spectroscopyPhysics::Plasma PhysicsSputteringTitanium dioxideMaterials Chemistrysense organsPhysics::Chemical PhysicsNuclear chemistrydescription
Abstract Compositional and chemical changes of titanium dioxide monocrystalline surfaces induced by bombardment with 4 keV argon and oxygen ions have been studied by AES, XPS and AFM. Argon ion bombardment induced strong changes in the composition and chemical state of the surface: loss of oxygen due to preferential sputtering occurred, and, related to this, Ti4+ species were reduced to Ti3+ and Ti2+. During oxygen bombardment, competition between preferential sputtering of oxygen ions of the oxide surface and oxygen implantation was observed. This phenomenon was found to be strongly dependent upon the incidence angle of the oxygen ions. Moreover, an oxygen bombardment with normal incidence of the surface that had been previously submitted to an argon ion bombardment led to a restoichiometrization of the surface: no further Ti3+ or Ti2+ was found by XPS, only Ti4+.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 1998-08-01 | Surface Science |