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RESEARCH PRODUCT
Effect of changing pulse rate on profile parameters of perceptual thresholds and loudness comfort levels and relation to ECAP thresholds in recipients of the Nucleus CI24RE device.
Alicia Huarte IrujoErwin OffeciersLaura Cavallé GarridoThomas WesargÁNgel Ramos MacíasJoerg PeschAndre MorsnowskiAndrzej ZarowskiGuido F. SmoorenburgNorbert DillierGerben RypkemaMatthias HeyLuis García-ibáñezRolf-dieter Battmersubject
AdultPulse repetition frequencyLinguistics and Languagemedicine.medical_specialty3616 Speech and HearingLoudness Perceptionmedia_common.quotation_subjectAction PotentialsDifferential Threshold610 Medicine & health10045 Clinic for OtorhinolaryngologyStimulus (physiology)AudiologyCurvatureLanguage and LinguisticsLoudnessAutomationYoung AdultSpeech and HearingPerceptionmedicineHumansComfort levels1203 Language and LinguisticsAgedmedia_commonMathematicsPrincipal Component AnalysisAuditory ThresholdMiddle AgedElectric Stimulation3310 Linguistics and LanguageCochlear Implantsmedicine.anatomical_structurePulse rateAuditory PerceptionHuman medicineNoiseNucleusdescription
Abstract: The Nucleus CI24RE Freedom device offers higher stimulation rates and lower noise levels in action potential measurements (ECAPs) than previous devices. A study including ten European implant teams showed that the effect of changes in rate from 250 to 3500 pulses per second on tilt and curvature of the T and C profiles is insignificant. When changing rate one may change the levels at all electrodes by the same amount. Using an automated procedure ECAPs could be measured quickly and reliably at a noise level of only 1 μV. However, this did not result in improved correlations between the tilt and curvature parameters of the ECAP profiles and those of the T and C profiles. Average C levels appear to differ markedly among implant centers; a better assessment protocol is required. When increasing stimulus rate one should take into account that this requires higher pulse charges per second and more power consumption.
year | journal | country | edition | language |
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2010-01-01 |