6533b859fe1ef96bd12b7678
RESEARCH PRODUCT
Pattern image enhancement by extended depth of field
Stéphane BinczakSamuel ChefSamuel ChefKevin SanchezSabir JacquirBastien BilliotPhilippe Perdusubject
business.industryMagnificationImage processingCondensed Matter PhysicsLaserAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionFocus stackingOptical axisOpticslawComputer visionDepth of fieldArtificial intelligenceElectrical and Electronic EngineeringSafety Risk Reliability and QualitybusinessFocus (optics)Infrared microscopyMathematicsdescription
Abstract Most optical defect localization techniques such as dynamic laser stimulation or photon emission microscopy require a pattern image of the device to be taken. The main purpose is for device navigation, but it also enables the analyst to identify the location of the monitored activity by superimposing it onto the pattern image. The defect localization workflow usually starts at low or medium magnification. At these scales, several factors can lead to a lack of orthogonality of the sample with the optical axis of the system. Therefore, images can be locally out of focus and poorly resolved. In this paper, a method based on Depth of Field Extension is suggested to correct the pattern image.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2014-09-01 | Microelectronics Reliability |