6533b859fe1ef96bd12b7f9f

RESEARCH PRODUCT

Study of interface diffusion of Ti and TiN PVD layers by Bremsstrahlung-induced AES

D. HanzelW. Meisel

subject

ChemistryDiffusionAnalytical chemistrychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistrySubstrate (electronics)engineering.materialCondensed Matter PhysicsOxygenNitrogenSurfaces Coatings and FilmsCoatingX-ray photoelectron spectroscopyChemical engineeringMaterials ChemistryengineeringTinLayer (electronics)

description

The influence of heat treatment in ultrahigh vacuum (UHV) on Ti and TiN layers coated by physical vapour deposition (PVD) has been studied by AES, XPS and bremsstrahlung-induced AES. It could be concluded that up to 500 o C (1 h) the Ti layer does not change significantly. At the TiN/steel substrate interface, however, a counter-diffusion of nitrogen and adventitious oxygen takes place, resulting in partial nitridation of the steel substrate and oxidation of the coating

https://doi.org/10.1002/sia.740180407