6533b85bfe1ef96bd12bb368
RESEARCH PRODUCT
The spatial distribution of non-linear effects in multi-photon photoemission from metallic adsorbates on Si(1 1 1)
Gerd SchönhenseOliver G. SchmidtOliver G. SchmidtYeukuang HwuGerhard H. FecherGerhard H. Fechersubject
SiliconChemistryAnalytical chemistryPhysics::Opticschemistry.chemical_elementSurfaces and InterfacesElectronPhoton energyPhotoelectric effectCondensed Matter PhysicsMolecular physicsSurfaces Coatings and FilmsCondensed Matter::Materials SciencePhotoemission electron microscopyFemtosecondMaterials ChemistryWork functionThin filmdescription
Multi-photon excitations from thin metallic films on silicon substrates have been observed utilising photoemission electron microscopy. The photoelectrons have been excited by means of high power femtosecond laser pulses with a photon energy below the work function threshold. The strong spatial variations of the non-linear effects became directly visible in electron emission from the adsorbed thin films. Centres of enhanced photoelectron yield, so-called hot spots, were observed on the surfaces of various samples. The multi-photon electron yield of the metallic films (permalloy and lead) depends strongly on the sample topography and the photon polarisation.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2001-06-01 | Surface Science |