6533b85bfe1ef96bd12bbcc7
RESEARCH PRODUCT
Inclusive $$\bar K^{0*} (892)$$ andK 0*(892) production on silicon by 200 GeVK − andπ −
H. PalkaE. BelauE. HigonJ. RichardsonD. P. KelseyS. WattsP. WeilhammerP. GrasH.g.j.m. TieckeH. DietlG. De RijkM. RozanskaM. TuralaM. BosmanL. W. WiggersA. R. GillmanM. PepeG. WaltermannD. BucholzZ. HajdukW. MännerV. CastilloS. KwanH. BeckerB.d. HyamsFred WickensK. RybickiJ. KemmerT. BöhringerB. LückingT. ZeludziewiczH.f. FawcettE. NeugebauerJ. MalosG. PolokU. StierlinS. BarlagR. KlannerR. J. TapperG. LütjensT. GoochS. GillG. LutzC. DaumR.s. GilmoreU. KötzH. J. SeebrunnerV. ChabaudA. WylieC.j.s. Damerellsubject
PhysicsNuclear physicsPhysics and Astronomy (miscellaneous)SiliconchemistryTransverse momentumchemistry.chemical_elementAtomic physicsEngineering (miscellaneous)description
The production of the neutralK− (892) resonances by 200 GeVK− andπ− has been studied over the kinematic range 0.0<xf<1.0 andpt2<5.0 GeV2. Longitudinal and transverse momentum distributions are presented. In addition the decay angular distributions inK− fragmentation to\(\bar K^{0*} \) have been investigated.
year | journal | country | edition | language |
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1990-12-01 | Zeitschrift für Physik C Particles and Fields |