6533b85ffe1ef96bd12c0f70

RESEARCH PRODUCT

UV optical record and electron beam lithography in polymer films

Janis TeterisV. KolobjonoksA. GerbredersO Shimane

subject

chemistry.chemical_classificationMaterials sciencePhotoisomerizationbusiness.industryResolution (electron density)PolymerOpticsPolymerizationchemistryCopolymerOptoelectronicsMoleculeX-ray lithographybusinessElectron-beam lithography

description

Possibility of UV optical record and electron beam lithography in different type of organic polymer films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrilates, and some block-copolymers are described. The element analysis of polyisoprene block copolymer was performed before and after UV illumination, and the changes in transmission spectra of the polymer film were measured. The resolution of electron beam lithography on polymer films was studied. In the polyisoprene block copolymer film the oxidation polymerization was ascertain at UV-illumination.

yearjournalcountryeditionlanguage
2012-08-20IOP Conference Series: Materials Science and Engineering
https://doi.org/10.1088/1757-899x/38/1/012027