0000000000139734
AUTHOR
A. Gerbreders
Optical properties of the low-molecular amorphous azochromophores and their application in holography
The films based on the low-molecular amorphous azochromophore 2-(3-(4-((4- (Ethyl(2-(trityloxy)ethyl)amino)phenyl)diazenyl)styryl)-5,5-dimethylcyclohex-2-enylidene) malononitrile (IWK-2M) were prepared. The optical properties of the material, such as transmittance and reflection spectra of the film, sensitivity to polarization holographic recording by two wavelengths (405 and 532 nm) were studied. The direct relief formation during the polarization holographic recording was explored, relief depth dependence on exposure and record beam intensity was investigated. The holographic matrix on this material base was produced without chemical etching process; the replication of holographic image w…
Direct Surface Relief Formation in Polymer Films
Due to active development of nanoelectronics, the studies of methods of nanorelief surface formation in different materials, in particular polymers are very important. Organic polymer films in consequence of their dielectric and optical properties have been used as basis of these devices. In this paper, the possibility of UV optical record and electron beam lithography in different type of polymeric films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrylates, and some block-copolymers were described. The element analysis of polybutadiene block co…
Photoinduced mass transport in low molecular organic glasses and its practical application in holography
Abstract In this paper we present the synthesis and optical properties of amorphous low molecular compound 4-((4-(bis(5,5,5-Triphenylpentyl)amino)phenyl)diazenyl)benzoic acid. The surface relief gratings formation by polarization holography method on these thin films (thicknesses are 200–1700 nm) was shown. The dependence of the surface relief modulation on various parameters: recording exposure dose, the polarization state of the recording beams, the grating period and the film thickness of the material was demonstrated. Values of surface tension at the air-film before and after irradiation of the substance by polarized radiation were measured. The efficiency of surface relief formation in…
Photosensitive properties of composite films based on copper chloride in polymer matrix
The composite films based on PMMA and CuCl2 were prepared. Transmission spectra of the films before and after illumination by different laser lines (405, 448, 456 nm) were measured. The reversible character of the composite photosensitivity was fixed. The phenomenon of direct surface relief formation after laser beam illumination of composite films was described. The holographic gratings were recorded by different exposure (200 – 500 J/cm2) in the films with different concentration (8 and 20 wt. %) of copper salt. The film sensitivity dependence on polymer molecular weight was studied. Surface relief of the gratings was measured by AFM.
Photosensitive polyurethanes for optical record
The method of synthesis of photosensitive polyurethanes polymers on glycerine, toluenediisocyanate and Disperse Red 1 base has been described. Two types of polymers with different amount of Disperse Red 1 fragments in macromolecules were compared. Films of the polymers were obtained from solutions in organic solvents on glass substrate. The dry film thickness was in the range of 3,5 - 4.5 μm. The transmission spectrums of the films were studied. Possibility of formation of side product in the process of synthesis was observed. The photobirefringence measurements of polymers films were performed. Surface relief grating (SRG) formation was observed during polarization holographic recording pr…
Optical grating recording in ChG thin film by electron beam
Abstract Recording capabilities of As Se S chalcogenide (ChG) glasses using electron beam (EB) lithography have been investigated in this study. After exposure with EB the thin films of these inorganic glasses can be etched in alkaline amine solvent with high selectivity. High resolution, smooth shaped structures have been fabricated using ChG thin films. Height of developed pattern can be controlled through changing applied electron dose.
Optical Properties of Composite Films Based on Copper Chloride in PMMA Matrix
The composite lms based on PMMA, CuCl2 and photoinitiator were prepared.Transmission spectra of the lms with and without photoinitiator were measured. The holo-graphic gratings were recorded, the sensitivity of the lms and surface structure of gratingswere studied. Microanalysis of the lms was performed in di erent part of structure elementsof grating.
Surface pattern recording in Sb2Se3 thin films
Abstract Results on the modification of Sb 2 Se 3 thin film surface topology by irradiation followed by wet-etching are given. Comparison of study results revealed the possible role of purely electronic and thermal processes in the relief formation. The latter is supposed to be connected with radiation-induced defect creation, free volume increase under the increased fluidity conditions as well as with the possible additional influence of electrostatic forces and stress. Changes in surface characteristics are presented and potential applications of this treatment are discussed.
<title>Photoinduced AsSeS thin film phase plates as adaptive optics mirrors for eye aberration correction</title>
Amorphous chalcogenide thin films are excellent materials for holographic recordings. AsSeS thin film coating is a useful optical material for it's thickness to be easily corrected with the use of exposure to light and consecutive chemical etching. Following properties allow to treat the surface of AsSeS chalcogenide films and to use them in adaptive optics systems for correction of the optical wavefront. Hereby, we characterize AsSeS film properties to be used for correction of optical aberrations of the human eye. The thickness of the film is characterized with the method of spectrodensitometry and the surface profile depth with a Hartman- Shack waveform analyzator.
Polarization holographic recording in Disperse Red1 doped polyurethane polymer film
In this report holographic recording of polarisation and surface relief gratings in Disperse Red 1 (DR1) doped polyurethane polymer films was studied. In this material DR1 is chemically bounded to polyurethane polymer main chain. Polarization holographic recording was performed by two orthogonal circularly polarized 532 nm laser beams. Photoinduced birefringence is a precondition for polarization holograms recording, therefore a detailed study of a photoinduced birefringence and changes of optical properties was performed. The lasers with wavelengths of 375nm, 448nm, 532 nm and 632.8 nm were used as pumping beam for sample excitation. The photoinduced birefringence Δn was measured at 532 nm…
<title>Holographic recording in polymer composites of organic photochromes and chalcogenides</title>
Recently a number of organic and inorganic materials have been studied for direct surface-relief formation during the exposure process by a light or e-beam. It is very promising for practical application enabling the possibility to simplify the surface-relief formation technology. In this report the method of preparation of thin polymer-chalcogenide and polymer-azobenzene composite films is described, and some features of photoinduced changes of optical properties and holographic recording of these materials are studied. Films of composites were obtained from solution of arsenic sulphide, Disperse red 1 and polymers in organic solvents. The solution was spread on glass substrate and dried. …
UV optical record and electron beam lithography in polymer films
Possibility of UV optical record and electron beam lithography in different type of organic polymer films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrilates, and some block-copolymers are described. The element analysis of polyisoprene block copolymer was performed before and after UV illumination, and the changes in transmission spectra of the polymer film were measured. The resolution of electron beam lithography on polymer films was studied. In the polyisoprene block copolymer film the oxidation polymerization was ascertain at UV-illuminati…