Search results for "DIELECTRICS"

showing 10 items of 19 documents

Capacitive effects in silicon-supported polyoxometalate-based nanocrystals

2011

Dielectrics nanocrystals AFM Langmuir-Blodgett
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Fabrication of Diffractive Optics: Surface Reliefs and Artificial Dielectrics

1997

After a period of fundamental theoretical research, the field of diffractive optics is now reaching a time of assessment, when we can define the useful limits of each design procedure. Selecting a suitable procedure derives from a compromise between several factors, including design time, desired optical efficiency, and precision. A major consideration in finding such a compromise has been, and still is today, the availability of technologies which can realize the design by generating the diffracting structure with assigned tolerances.

DiffractionOptical efficiencySurface (mathematics)MicrolensFabricationMaterials scienceOpticsbusiness.industryElectronic engineeringTheoretical researchbusinessArtificial dielectricsField (computer science)
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Local structural investigation of hafnia-zirconia polymorphs in powders and thin films by X-ray absorption spectroscopy

2019

Björn Matthey (Fraunhofer IKTS, Dresden) is acknowledged for providing HfO2 and ZrO2 powders on short notice after DESY’s renowned customs office punished us. Parts of this research were carried out at Petra III at DESY, a member of the Helmholtz Association (HGF). The experiments on single Si:HfO2 thin film samples were performed at the CLAESS beamline at ALBA Synchrotron with the collaboration of ALBA staff. We would like to thank Edmund Welter for assistance (in using beamline P65) and DESY for enabling this research for proposal no. 20160591 and for travel support. T.S. acknowledges the German Research Foundation (DFG) for funding this work in the frame of the project “Inferox” (project…

Ferroelectrics670Materials sciencePolymers and PlasticsAbsorption spectroscopyexafsExtended X-ray absorption fine structure X-ray absorption near edge structure Ferroelectrics Hafnium oxide Zirconium oxide02 engineering and technologydopants01 natural sciencesferroelectric propertieshafnium oxideTetragonal crystal systemformer soviet-unionzirconium oxideddc:6700103 physical sciences:NATURAL SCIENCES:Physics [Research Subject Categories]Zirconium oxideX-ray absorption near edge structureThin filmx-ray absorption near edge structureExtended X-ray absorption fine structureHafnium oxideErweiterte Röntgenabsorptionsfeinstruktur Röntgenabsorptionsstruktur in Randnähe Ferroelektrika Hafniumoxid Zirkoniumoxid010302 applied physicsX-ray absorption spectroscopybiologyExtended X-ray absorption fine structureferroelectricsMetals and Alloyshfo2021001 nanoscience & nanotechnologyHafniabiology.organism_classificationXANESstabilizationdielectricsElectronic Optical and Magnetic Materialsoxygen-ion conductorselectrochemistryextended x-ray absorption fine structureChemical physicsCeramics and Compositesinterface0210 nano-technologyMonoclinic crystal systemActa Materialia
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Actual physical and chemical problems of ferroelectrics

1991

FerroelectricsElectricityElectrostaticsDielektriķi:NATURAL SCIENCES::Physics [Research Subject Categories]DielectricsElektrībaSegnetoelektrībaSegnetoelektriķi
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Energy and spatial distribution of traps in SiO2/Al 2O3 nMOSFETs

2006

The energy and spatial profiling of the interface and near-interface traps in n-channel MOSFETs with SiO2/Al2O3 gate dielectrics is investigated by charge-pumping (CP) measurements. By increasing the amplitude as well as lowering the frequency of the gate pulse, an increase of the charge recombined per cycle was observed, and it was explained by the contributions of additional traps located higher in energy and deeper in position at the SiO2/Al2O3 interface. In addition, CP currents, acquired after different constant voltage stress, have been used to investigate the trap generation in this dielectric stack. © 2006 IEEE.

GATE STACKSBulk trapInterface trapHigh-κ dielectricINTERFACE OXIDE TRAPSPhysics::OpticsEnergy distributionSettore ING-INF/01 - ElettronicaComputer Science::OtherCondensed Matter::Materials ScienceCharge pumping (CP)DIELECTRICSRELIABILITYCHARGE-PUMPING TECHNIQUEElectrical and Electronic EngineeringSpatial profiling
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A robust and efficient method for obtaining the complex modes in inhomogeneously filled waveguides

2003

In this paper, we present a computational simulation of the complex wave propagation in inhomogeneously filled waveguides with lossless and lossy dielectrics. We use a biorthonormal-basis method as a numerical technique. The behavior of complex modes in different waveguides whose characterization with other methods involves some difficulties is analyzed. © 2003 Wiley Periodicals, Inc. Microwave Opt Technol Lett 37: 218–222, 2003; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.10875

Lossless compressionbusiness.industryWave propagationComputer scienceNumerical techniqueCondensed Matter PhysicsLossy dielectricsAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic MaterialsCharacterization (materials science)Computational simulationOpticsElectrical and Electronic EngineeringbusinessGalerkin methodMicrowaveMicrowave and Optical Technology Letters
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Smart High-κ Nanodielectrics Using Solid Supported Polyoxometalate-Rich Nanostructures

2011

Utilizing Langmuir-Blodgett deposition and scanning probe microscopy, we have investigated the extent to which cations alter the self-assembly processes of hybrid polyoxometalates (POMs) on surfaces. The well-defined 2D hexagonal nanostructures obtained were extensively characterized and their properties were studied, and this has revealed fascinating dielectric behavior and reversible capacitive properties. The nanostructures are extremely stable under ambient conditions, and yet exhibit fascinating self-patterning upon heating. These findings present POMs as effective smart nanodielectrics and open up a new field for future POM applications. (c) 2011 American Chemical Society.

Materials scienceNanostructureMacromolecular SubstancesSurface PropertiesMolecular ConformationGeneral Physics and AstronomyNanotechnologyDielectricsurfacesSmart materialScanning probe microscopyMaterials TestingElectric ImpedanceIntelligent materialsGeneral Materials ScienceParticle SizeCation exchangesDielectric behaviorPolyoxometalateHexagonal crystal systemPolyoxometalatesGeneral EngineeringOxidesself-assemblyTungsten CompoundsSelf assemblyNanodielectricsNanostructuresHigh-κ NanodielectricSelf assembly processScanning probe microscopyLangmuir-Blodgett depositionPositive ionsPolyoxometalateSelf-assembly2D-hexagonalAmbient conditions
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Anodization and anodic oxides

2018

Anodizing is a low-temperature, low-cost electrochemical process allowing for the growth, on the surface of valve metals and valve metal alloys, of anodic oxides of tunable composition and properties. This article is an overview on theoretical aspects concerning the general aspects of the kinetics of growth of barrier and porous anodic oxides and some of their present and possibly future technological applications of anodic oxides. The first part of the article is devoted to anodic oxide growth models, from Guntherschulze and Betz work (in 1934) to the more recent results on barrier and porous oxide films. The second part is focused on industrial processes to fabricate anodic oxides and the…

Materials scienceNanotechnology02 engineering and technologyDielectricAnodizingElectrochemistryCorrosionAl alloysMicroelectronicsCoatings0502 economics and businessGrowth kineticsValve metals050207 economicsThin filmPorosityHigh-k materialsElectrolytic capacitorBarrier-type oxidesAnodizing05 social sciencesMetallurgy021001 nanoscience & nanotechnologyPorous-type oxidesAnodeCorrosionSettore ING-IND/23 - Chimica Fisica ApplicataAnodic oxidesAlumina membranesDielectrics0210 nano-technologyAluminum
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Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides

2018

Producción Científica

Materials scienceSilicon116 Chemical sciencesta221chemistry.chemical_element02 engineering and technologyDielectricChemical vapor deposition7. Clean energy01 natural sciencesSpray pyrolysisThermal barrier coatingÓxidos metálicosSPRAY-PYROLYSISDIELECTRICSnanorakenteetmagnetoelectrics0103 physical sciencesNanolaminatesnanolaminatesSILICON010302 applied physicsZirconiumta114ZRO2 THIN-FILMSCO3O4 FILMSBUFFER LAYERatomikerroskasvatus021001 nanoscience & nanotechnologyElectronic Optical and Magnetic MaterialsTHERMAL BARRIER COATINGSCHEMICAL-VAPOR-DEPOSITIONchemistryChemical engineeringLASER DEPOSITIONNanoláminasatomic layer depositionMetal oxides221 Nano-technologyohutkalvot0210 nano-technologyLayer (electronics)CobaltGAS SENSORS
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Hot carrier effects in n-MOSFETs with SiO2/HfO2/HfSiO gate stack and TaN metal gate

2009

Charge trapping and trap generation in field-effect transistors with SiO2/HfO2/HfSiO gate stack and TaN metal gate electrode are investigated under uniform and non-uniform charge injection along the channel. Compared to constant voltage stress (CVS), hot carrier stress (HCS) exhibits more severe degradation in transconductance and subthreshold swing. By applying a detrapping bias, it is demonstrated that charge trapping induced degradation is reversible during CVS, while the damage is permanent for hot carrier injection case. © 2008 Elsevier B.V. All rights reserved.

Materials sciencebusiness.industryTransconductanceTransistorTrappingCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionStress (mechanics)lawElectrodeOptoelectronicsDegradation (geology)High-k dielectrics Hot carrier stress Constant voltage stressElectrical and Electronic EngineeringMetal gatebusinessHot-carrier injection
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