Search results for "Hydrofluoric acid"

showing 4 items of 24 documents

Shear bond strength of metal brackets to ceramic surfaces using a universal bonding resin.

2017

BACKGROUND: Assure Plus is a recently introduced universal adhesive with the ability to bond to various restorations. This study compared the shear bond strength of brackets bonded to two types of ceramics using conventional bonding agent and Assure Plus. Surface damage caused by debonding was also evaluated. MATERIAL AND METHODS: In this in vitro study, 40 feldspathic and lithium disilicate ceramic discs were sandblasted, etched with 9.6% hydrofluoric acid and divided into two groups. In group 1, silane was applied and air-dried followed by application of Transbond XT primer, which was light-cured. In group 2, Assure Plus was applied and air-dried. In both groups, maxillary central incisor…

Universal testing machineMaterials scienceBond strengthResearchBracketOrthodontics030206 dentistryDental bonding:CIENCIAS MÉDICAS [UNESCO]Silane030207 dermatology & venereal diseases03 medical and health scienceschemistry.chemical_compound0302 clinical medicineHydrofluoric acidchemistryvisual_artUNESCO::CIENCIAS MÉDICASvisual_art.visual_art_mediumCeramicAdhesiveComposite materialGeneral DentistryJournal of clinical and experimental dentistry
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Changes in surface stress, morphology and chemical composition of silica and silicon nitride surfaces during the etching by gaseous HF acid

2007

International audience; HF acid attack of SiO2 and Si3N4 substrates is analyzed to improve the sensitivity of a sensor based on inicrocantilever. Ex situ analysis of the etching using XPS, SIMS and AFM show significant changes in the anisotropy and the rate of the etching of the oxides on SiO2 and Si3N4 surface. Those differences influence the kinetic evolution of the plastic bending deflection of the cantilever coated with SiO2 and Si3N4 layer, respectively. The linear dependence between the HF concentration and the Si3N4 cantilever bending corresponds to a deep attack of the layer whereas the nonlinear behavior observed for SiO2 layer can be explained by a combination of deep and lateral …

atomic force microscope (AFM)[SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicssiliconX-ray photoelectron spectroscopy (XPS)HYDROGEN-FLUORIDECORROSIONRESONANCEAQUEOUS HYDROFLUORIC-ACIDhydrofluoric acid (HF)sensorCERAMICSMICROCANTILEVERSsecondaryEOLEOLion mass spectroscopy (SIMS)[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsSI(111) SURFACESCANTILEVERS[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicscantileverGAS SENSORS
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Comparative study of initial stages of copper immersion deposition on bulk and porous silicon

2013

Initial stages of Cu immersion deposition in the presence of hydrofluoric acid on bulk and porous silicon were studied. Cu was found to deposit both on bulk and porous silicon as a layer of nanoparticles which grew according to the Volmer-Weber mechanism. It was revealed that at the initial stages of immersion deposition, Cu nanoparticles consisted of crystals with a maximum size of 10 nm and inherited the orientation of the original silicon substrate. Deposited Cu nanoparticles were found to be partially oxidized to Cu2O while CuO was not detected for all samples. In contrast to porous silicon, the crystal orientation of the original silicon substrate significantly affected the sizes, dens…

inorganic chemicalsMaterials scienceImmersion depositionSiliconNanochemistryNanoparticlechemistry.chemical_elementNanotechnologyPorous siliconcomplex mixtureschemistry.chemical_compoundHydrofluoric acidMaterials Science(all)Porous siliconnanotechnology nanotechnology and microengineering nanoscale science and technologyGeneral Materials ScienceNano ExpressNanocrystalline silicontechnology industry and agricultureCondensed Matter Physicsequipment and suppliesCopperstomatognathic diseasesElectron backscatter diffractionChemical engineeringchemistrycopper nanoparticles; electron backscatter diffraction; immersion deposition; nanotechnology nanotechnology and microengineering nanoscale science and technology; porous siliconCopper nanoparticlesElectron backscatter diffractionNanoscale Research Letters
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The measurement of impurities in silicon for solar cell production

2012

The power conversion efficiency of solar cells is largely dependent on impurity levels in silicon. In the current investigations two sample preparation methods of silicon had been used before analysis - acid dissolution at atmospheric pressure and pressured microwave assisted technique. Quantification of impurities in solar silicon was done by inductively coupled plasma mass spectrometry and electrothermal atomic spectrometry. Microwave assisted dissolution of solar silicon was more effective compared to the traditional dissolution method on the hot plate, but complete dissolution of impurities and silicon matrix was achieved with a nitric and hydrofluoric acid mixture. The mass of solar si…

inorganic chemicalsSiliconPhysics::Instrumentation and DetectorsChemistrytechnology industry and agricultureAnalytical chemistrychemistry.chemical_elementAtomic spectroscopyequipment and suppliescomplex mixtureslaw.inventionstomatognathic diseaseschemistry.chemical_compoundHydrofluoric acidlawImpuritySolar cellDissolutionInductively coupled plasma mass spectrometryMicrowaveIOP Conference Series: Materials Science and Engineering
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