Search results for "Interfaces"

showing 10 items of 1258 documents

Advances and challenges for experiment and theory for multi-electron multi-proton transfer at electrified solid-liquid interfaces.

2020

Multi-electron, multi-proton transfer is important in a wide spectrum of processes spanning biological, chemical and physical systems. These reactions have attracted significant interest due to both fundamental curiosity and potential applications in energy technology. In this Perspective Review, we shed light on modern aspects of electrode processes in the 21st century, in particular on the recent advances and challenges in multistep electron/proton transfers at solid–liquid interfaces. Ongoing developments of analytical techniques and operando spectrometry at electrode/electrolyte interfaces and reliable computational approaches to simulate complicated interfacial electrochemical reaction…

Materials scienceProcess (engineering)elektroditPhysical systemGeneral Physics and AstronomyNanotechnology02 engineering and technologyElectron010402 general chemistry021001 nanoscience & nanotechnologyEnergy technology01 natural sciencespintakemiasähkökemia0104 chemical scienceselectrified solid–liquid interfacesProton (rocket family)multi-electron multi-proton transferPhysical and Theoretical Chemistry0210 nano-technologySolid liquidPhysical chemistry chemical physics : PCCP
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High power impulse magnetron sputtering of Zn/Al target in an Ar and Ar/O2 atmosphere: The study of sputtering process and AZO films

2019

Financial support provided by Scientific Research Project for Students and Young Researchers Nr. SJZ/2017/4 realised at the Institute of Solid State Physics, University of Latvia is greatly acknowledged.

Materials scienceReactive sputteringAnalytical chemistryAl (AZO) films [ZnO]02 engineering and technology7. Clean energy01 natural sciencesSputteringElectrical resistivity and conductivity0103 physical sciencesMaterials ChemistryTransmittance:NATURAL SCIENCES:Physics [Research Subject Categories]Thin filmPower density010302 applied physicsPulse durationHiPIMSSurfaces and InterfacesGeneral ChemistryPartial pressure021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and FilmsSustained self-sputteringHigh-power impulse magnetron sputtering0210 nano-technologyRoom temperature depositionSurface and Coatings Technology
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Synthesis of Au-CdS@CdSe Hybrid Nanoparticles with a Highly Reactive Gold Domain.

2017

We propose a novel route to synthesize semiconductor–gold hybrid nanoparticles directly in water, resulting in much larger gold domains than previous protocols (up to 50 nm) with very reactive surfaces which allow further functionalization. This method advances the possibility of self-assembly into complex structures with catalytic activity toward the reduction of nitro compounds by hydrides. The large size of these gold domains in hybrid particles supports efficient light scattering at the plasmon resonance frequency, making such structures attractive for single-particle studies.

Materials scienceReduction of nitro compoundsNanoparticleNanotechnology02 engineering and technologySurfaces and Interfaces010402 general chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesLight scattering0104 chemical sciencesDomain (software engineering)CatalysisElectrochemistrySurface modificationGeneral Materials ScienceSurface plasmon resonance0210 nano-technologySpectroscopyLarge sizeLangmuir : the ACS journal of surfaces and colloids
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Power ultrasound irradiation during the alkaline etching process of the 2024 aluminium alloy

2015

Abstract Prior to any surface treatment on an aluminum alloy, a surface preparation is necessary. This commonly consists in performing an alkaline etching followed by acid deoxidizing. In this work, the use of power ultrasound irradiation during the etching step on the 2024 aluminum alloy was studied. The etching rate was estimated by weight loss, and the alkaline film formed during the etching step was characterized by glow discharge optical emission spectrometry (GDOES) and scanning electron microscope (SEM). The benefit of power ultrasound during the etching step was confirmed by pitting potential measurement in NaCl solution after a post-treatment (anodizing).

Materials scienceScanning electron microscopeAlloyGeneral Physics and Astronomychemistry.chemical_elementmacromolecular substances02 engineering and technologyengineering.material010402 general chemistry01 natural sciencesstomatognathic systemEtching (microfabrication)Aluminium[CHIM]Chemical SciencesReactive-ion etchingComputingMilieux_MISCELLANEOUSGlow dischargeAnodizingfungiMetallurgytechnology industry and agricultureSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesSurfaces Coatings and FilmschemistryengineeringDry etching0210 nano-technology
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Properties of spark plasma sintered nanostructured Zn1+xSb

2011

Engineering materials with specific physical properties has recently focused on the effect of nanoscopic inhomogeneities at the 10 nm scale. Such features are expected to scatter medium and long-wavelength phonons lowering thereby the thermal conductivity of the system without simultaneously decreasing the charge transport (phonon–glass electron–crystal concept). A new Zn1+xSb nanophase obtained by a wet chemical approach was densified by spark plasma sintering (SPS). Investigations on compounds subsumed as “Zn4Sb3” always suffer from its low thermal stability and the contamination of the nanoparticles with solvents and additives used in the synthesis. In order to gain insight into this com…

Materials scienceScanning electron microscopeMetallurgyPelletsSpark plasma sinteringSinteringNanoparticleSurfaces and InterfacesCondensed Matter PhysicsThermoelectric materialsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsChemical engineeringPhase (matter)Materials ChemistryElectrical and Electronic EngineeringPorosityphysica status solidi (a)
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Vacuum arc deposition of protective layers on glass and polymer substrates

2001

Abstract Vacuum arc deposition allows one to deposit various coatings on insulating and temperature-sensitive substrates (like polymers). An advantage of the vacuum arc deposition technique is the low substrate temperature during the deposition process. A vacuum arc deposition apparatus for the coating of large-area substrates has been developed. Ti, TiN, TiO 2 and diamond-like single and multilayer coatings have been deposited on plastic and glass substrates. The vacuum arc technology permits formation of multilayer colour filters of high uniformity on substrates with dimensions up to 2000×1400 mm 2 . The microstructure, chemical composition and optical properties of the deposited coatings…

Materials scienceScanning electron microscopeMetals and AlloysMineralogySurfaces and InterfacesVacuum arcCombustion chemical vapor depositionengineering.materialElectrostatic spray-assisted vapour depositionSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsPulsed laser depositionCoatingCathodic arc depositionMaterials ChemistryengineeringDeposition (phase transition)Composite materialThin Solid Films
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Deformation behavior of nanostructured ZnO films on glass

2012

Abstract Nanostructured ZnO films on glass substrate were studied by nanoindentation, scanning electron and atomic force microscopy. The films were obtained by a straightforward mechanoactivated oxidation method. The morphology of the obtained films was grained with a grain size in the range 50–100 nm and the thickness was approximately 2 μm. A detailed deformation behavior of ZnO films, critical parameters and indentation induced plastic deformation mechanisms were determined in correlation to bulk ZnO, Si single crystal and commercial ZnO films. In comparison to a single crystal ZnO, nanostructured films exhibit increased hardness (9 GPa); however, the Young's modulus is decreased (120 GP…

Materials scienceScanning electron microscopeMetals and AlloysSurfaces and InterfacesNanoindentationGrain sizeSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsBrittlenessIndentationMaterials ChemistryGrain boundaryComposite materialDeformation (engineering)Single crystalThin Solid Films
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Perovskite thin films grown by direct liquid injection MOCVD

2007

Abstract The continuous scaling down of devices dimensions, in silicon technology, imposes to replace silicon dioxide. Among the potential candidates for new capacitors, some perovskite structure materials (such as titanate or zirconate) show interesting characteristics. The first way to develop perovskite films is to use a mixture of two β-diketonates by varying the solution's cationic ratio. However, our previous results on SrZrO3 showed that a wide parametric study had to be carried on. Another way is to design novel heterometallic precursors that contain both cations on the same molecule. The ligands could be chosen so that peculiar evaporation and decomposition temperatures could be ob…

Materials scienceSiliconAnalytical chemistryGeneral Physics and AstronomyMineralogychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryChemical vapor depositionCondensed Matter PhysicsTitanateZirconateSurfaces Coatings and FilmsAmorphous solidSurface coatingchemistryThin filmPerovskite (structure)Applied Surface Science
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Chemical characterization of gallium droplets grown by LP-MOCVD.

2006

International audience; This study is concerned with the chemical characterization of metallic gallium droplets, obtained on silicon (1 0 0) substrates with a single growth step, by the LP-MOCVD technique with TMGa like precursor. These structures are characterized by SIMS, XPS and TEM. The analyses results lead to a structure proposition for the droplets. The core is composed of metastable metallic gallium with a non-negligible carbon quantity probably coming from incomplete precursor decomposition. The outer part, composed of gallium oxide maintains the structure stability. Covering of the substrate by a thin gallium layer of gallium compounds is observed.

Materials scienceSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technologySubstrate (electronics)Chemical vapor deposition010402 general chemistry01 natural sciencesX-ray photoelectron spectroscopyGallium dropletsXPSMetalorganic vapour phase epitaxyGalliumSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesSurfaces Coatings and FilmschemistryTransmission electron microscopyMOCVDTEM0210 nano-technologyLayer (electronics)SIMS
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Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration

2017

Room-temperature plasma-enhanced atomic layer deposition (PEALD) of ZnO was studied by depositing the films using diethylzinc and O2 plasma from inductively-coupled plasma (ICP) and capacitively-coupled plasma (CCP) plasma source configurations. The CCP-PEALD was operated using both remote and direct plasma. It was observed that the films deposited by means of remote ICP and CCP were all highly oxygen rich, independently on plasma operation parameters, but impurity (H, C) contents could be reduced by increasing plasma pulse time and applied power. With the direct CCP-PEALD the film composition was closer to stoichiometric, and film crystallinity was enhanced. The ZnO film growth was observe…

Materials scienceSiliconAnalytical chemistrychemistry.chemical_element02 engineering and technology01 natural sciencescapacitively-coupled plasmaAtomic layer depositionCrystallinitysinkkioksidiImpurity0103 physical sciencesMaterials ChemistryCapacitively coupled plasmata116Plasma processingplasma-enhanced atomic layer deposition010302 applied physicsta114zinc oxideSurfaces and InterfacesGeneral ChemistryPlasma021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmsinductively-coupled plasmachemistryInductively coupled plasma0210 nano-technologySurface and Coatings Technology
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