Search results for "MAGNETRON"
showing 10 items of 39 documents
Electrochromic Devices Incorporating Cr Oxide And Ni Oxide Films:
2000
Abstract Transparent films of Cr oxide and Ni oxide were made by reactive DC magnetron sputtering in Ar+O2+H2. They displayed anodic electrochromism with charge capacities similar to that of W oxide. Cr oxide was stable in acidic environments, while Ni oxide was stable in basic environments. Electrochromic devices were made with pristine Cr oxide or Ni oxide films operating in conjunction with W oxide and a proton conducting electrolyte. Of the two oxides, Cr oxide film allowed device operation at a lower voltage span, while the device with Ni oxide film yielded a higher transmittance in the bleached state, a larger absorptance modulation, and a more neutral color.
Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition
2013
Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers play an important role on the properties of the nanostructured films grown on top of them. Additionally, these primary oxide layers prevent direct hole combination when used in optoelectronic devices. Structural and optical characterizations were carried out by scanning electron microscopy, atomic for…
Effect of germanium addition on the properties of reactively sputtered ZrN films
2005
For the first time, Zr-Ge-N films were deposited on silicon and steel substrates by sputtering a Zr-Ge composite target in reactive Ar-N2 mixture. The films were characterised by electron probe microanalysis, X-ray diffraction, micro-Raman spectroscopy and depth-sensing indentation. The effects of the Ge content and substrate bias voltage on the films' structure, internal stress, hardness and oxidation resistance were investigated. Substrate bias strongly influenced the chemical composition of the films being observed by means of a steep decrease in the Ge content for negative bias voltages higher than -80 V. In these cases, a significant hardness improvement was registered. For -100 V bias…
Structural and electrical properties of magnetron sputtered Ti(ON) thin films:The case of TiN doped in situ with oxygen.
2009
International audience; Incorporation of oxygen into TiN lattice results in formation of titanium oxynitrides, TiOxNy that have become particularly interesting for photocatalytic applications. Elaboration as well as characterization of TiN and in situ oxygen-doped thin films is the subject of this paper. Thin films, 250–320nm in thickness, have been deposited by dc-pulsed magnetron reactive sputtering from Ti target under controllable gas flows of Ar, N2 and O2. Optical monitoring of Ti plasma emission line at = 500nm has been implemented in order to stabilize the sputtering rate. Scanning electron microscopy (SEM), X-ray diffraction in grazing incidence (GIXRD), micro-Raman spectroscopy, X…
Changes in structure and conduction type upon addition of Ir to ZnO thin films
2017
Zn-Ir-O (Zn/Ir ≈ 1/1) thin films have been reported to be a potential p-type TCO material. It is, however, unknown whether it is possible to achieve p-type conductivity at low Ir content, and how the type and the magnitude of conductivity are affected by the film structure. To investigate the changes in properties taking place at low and moderate Ir content, this study focuses on the structure, electrical and optical properties of ZnO:Ir films with iridium concentration varying between 0.0 and 16.4 at.%. ZnO:Ir thin films were deposited on glass, Si, and Ti substrates by DC reactive magnetron co-sputtering at room temperature. Low Ir content (up to 5.1 at.%) films contain both a nano-crysta…
Magnetron sputtering fabrication of α-Al2O3:Cr powders and their thermoluminescence properties
2018
The authors gratefully acknowledge the financial support for this work from research grant ERA.NET RUS Plus Nr.609556.
Electrochemically shape-controlled transformation of magnetron sputtered platinum films into platinum nanostructures enclosed by high-index facets
2017
Abstract A new method based on transformation of magnetron sputtered platinum thin films into platinum nanostructures enclosed by high-index facets, using electrochemical potential cycling in a twin working electrode system is reported. The controllable formation of various Pt nanostructures, described in this paper, indicates that this method can be used to control a selective growth of high purity Pt nanostructures with specific shapes (facets or edges). The method opens up new possibilities for electrochemical preparation of nanostructured Pt catalysts at high yield.
Étude par microscopie électronique et spectroscopie de films minces catalytiques pour micro piles à combustibles
2016
Předložená dizertační práce se zabývá studiem nových katalyzátorů na bázi kov-oxid vhodných pro použití v palivových článcích na straně anody. Platinou dopovaný oxid ceru připravený magnetronovým naprašováním ve formě tenkých vrstev na uhlíkových mezivrstvách nesených křemíkovým substrátem byl zkoumán prostřednictvím mikroskopických a spektroskopických metod. Vliv složení uhlíkového nosiče (a-C a CNx filmy), depozičního času CeOx vrstvy a dalších depozičních parametrů, např. depoziční rychlosti, složení pracovní atmosféry a Pt koncentrace na morfologii Pt-CeOx vrstev byl studován převážně pomocí transmisní elektronové mikroskopie (TEM). Získané výsledky ukazují, že vhodnou kombinací depozič…
Physicochemical characterisation of thermally aged anodic films on magnetron sputtered niobium
2010
The influence of thermal aging, at intermediate temperature (1h at 250°C) and in different environments, on the electronic and solid-state properties of stabilized 160 nm thick amorphous anodic niobia, grown on magnetron sputtered niobium metal, has been studied. A detailed physicochemical characterisation of the a-Nb2O5/0.5M H2SO4 electrolyte junction has been carried out by means of photocurrent and electrochemical impedance spectroscopy as well by differential admittance measurements. A change in the optical band gap (3.45 eV) of niobia film has been observed after aging (3.30 eV) at 250°C in air for 1 hour. A cathodic shift (0.15-0.2 Volt) in the flat band potential of the junction has …
Image charge shift in high-precision Penning traps
2019
An ion in a Penning trap induces image charges on the surfaces of the trap electrodes. These induced image charges are used to detect the ion's motional frequencies, but they also create an additional electric field, which shifts the free-space cyclotron frequency typically at a relative level of several ${10}^{\ensuremath{-}11}$. In various high-precision Penning-trap experiments, systematics and their uncertainties are dominated by this so-called image charge shift (ICS). The ICS is investigated in this work by a finite-element simulation and by a dedicated measurement technique. Theoretical and experimental results are in excellent agreement. The measurement is using singly stored ions a…