Search results for "Plating"

showing 10 items of 65 documents

Metal-organic chemical vapor deposition of Cr2O3 and Nd2O3 coatings. Oxide growth kinetics and characterization

2000

Thin oxide films of Cr2O3 and Nd2O3 were prepared, using Metal-Organic Chemical Vapor Deposition (MOCVD) technique, to protect stainless steels against corrosion at high temperature. The conditions of precursor volatilization were studied by thermogravimetry. Deposited film growth kinetics depended on the deposition parameters, particularly substrate temperature, gas flow rate and location of substrate in the coating reactor. The influence of the deposition parameters on the deposition rate and the uniformity of the films is discussed. The oxide films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and atomic force mi…

Materials scienceHybrid physical-chemical vapor depositionIon platingGeneral Physics and AstronomyMineralogySurfaces and InterfacesGeneral ChemistryChemical vapor depositionCombustion chemical vapor depositionCondensed Matter PhysicsElectron beam physical vapor depositionSurfaces Coatings and FilmsPulsed laser depositionCarbon filmChemical engineeringThin filmApplied Surface Science
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Wetting behavior of solid hydrogen films

1996

We have studied the dewetting of quench-condensed solid hydrogen films on bare and Ne plated Ag substrates. Information about the morphology of the films during the dewetting process is obtained from measurements of photoelectron tunneling through the films and complementary surface plasmon resonance data. Plating the Ag substrate with Ne films of various thickness allows to tune the strength of the van der Waals interaction with the hydrogen and thus to change the H2 films from a state of incomplete to complete wetting.

Materials scienceHydrogenGeneral Physics and Astronomychemistry.chemical_elementNanotechnologySubstrate (electronics)symbols.namesakeChemical engineeringchemistrySolid hydrogenPlatingsymbolsWettingDewettingvan der Waals forceSurface plasmon resonanceCzechoslovak Journal of Physics
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Substrate templating upon self-assembly of hydrogen-bonded molecular networks on an insulating surface.

2012

M olecular self-assembly on insulating surfaces, despite being highly relvant to many applications, generally suffers from the weak molecule–surface interactions present on dielectric surfaces, especially when benchmarked against metallic substrates. Therefore, to fully exploit the potential of molecular self-assembly, increasing the infl uence of the substrate constitutes an essential prerequisite. Upon deposition of terephthalic acid and trimesic acid onto the natural cleavage plane of calcite, extended hydrogen-bonded networks are formed, which wet the substrate. The observed structural complexity matches the variety realized on metal surfaces. A detailed analysis of the molecular struct…

Materials scienceHydrogenchemistry.chemical_elementNanotechnologyDielectric530bulk insulatorBiomaterialsMetalchemistry.chemical_compoundMoleculeGeneral Materials ScienceIntermolecular forceSubstrate (chemistry)self-assemblyGeneral Chemistryatomic forcechemistryChemical physicstemplatingvisual_artmicroscopyvisual_art.visual_art_mediumSelf-assemblyTrimesic acidcalciteBiotechnologySmall (Weinheim an der Bergstrasse, Germany)
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Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers

2008

http://link.aip.org/link/?JAPIAU/103/056108/1

Materials sciencePhotoluminescenceSapphireSpectral line intensityCadmium compoundsIon platingAnalytical chemistryUNESCO::FÍSICASemiconductor epitaxial layersGeneral Physics and AstronomyII-VI semiconductorsEpitaxyAcceptorVapour phase epitaxial growthEtchingEtching (microfabrication):FÍSICA [UNESCO]Ion beam assisted depositionMOCVDSapphireCadmium compounds ; Etching ; II-VI semiconductors ; Impurities ; Ion beam assisted deposition ; MOCVD ; Photoluminescence ; Sapphire ; Semiconductor epitaxial layers ; Spectral line intensity ; Vapour phase epitaxial growthMetalorganic vapour phase epitaxyIon beam-assisted depositionPhotoluminescenceImpurities
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Low Conductive Electrodeposited Poly(2,5-dimethoxyaniline) as a Key Material in a Double Lateral Heterojunction, for Sub-ppm Ammonia Sensing in Humid…

2019

We present a new device called a double lateral heterojunction (DLH) as an ammonia sensor in humid atmosphere. It combines polyaniline derivatives in their poor conducting state with a highly conductive molecular material, lutetium bisphthalocyanine, LuPc2. Polyaniline and poly(2,5-dimethoxyaniline) are electrodeposited on ITO interdigitated electrodes, leading to an original device that can be obtained only by electrochemistry and not by other solution processing techniques. Both polymers lead to highly conducting materials that require a neutralization step before their coverage by LuPc2. While the device based on polyaniline shows ohmic behavior, the nonlinear I- V characteristics of the…

Materials sciencePolymersBioengineering02 engineering and technologyElectrochemistry01 natural scienceschemistry.chemical_compoundAmmoniaLimit of DetectionPolyaniline[CHIM]Chemical SciencesInstrumentationOhmic contactElectrical conductorComputingMilieux_MISCELLANEOUSFluid Flow and Transfer ProcessesConductive polymerchemistry.chemical_classificationAniline Compoundsbusiness.industryProcess Chemistry and Technology010401 analytical chemistryElectric ConductivityHumidityHeterojunctionPolymer021001 nanoscience & nanotechnologyElectroplating0104 chemical sciencesDielectric spectroscopySemiconductorschemistryOptoelectronics0210 nano-technologybusiness
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Influence of the Electrochemical Parameters on the Properties of Electroplated Au-Cu Alloys

2011

Materials scienceRenewable Energy Sustainability and the EnvironmentMetallurgyMaterials ChemistryElectrochemistryCondensed Matter PhysicsElectroplatingElectrochemistrySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsJournal of The Electrochemical Society
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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

2014

In this paper, we report ALD deposition of silicon dioxide using either thermal or plasma enhanced atomic layer deposition (PEALD). Several aminosilanes with differing structures and reactivity were used as silicon precursors in R&D single wafer ALD tools. One of the precursors was also tested on pilot scale batch ALD using O3 as oxidant and with substrates measuring 150 × 400 mm. The SiO2 film deposition rate was greatly dependent on the precursors used, highest values being 1.5-2.0 Å/cycle at 30-200°C for one precursor with an O2 plasma. According to time-of-flight-elastic recoil detection analysis measurements carbon and nitrogen impurities were relatively low, but hydrogen content i…

Materials scienceSiliconSilicon dioxideta221Conformal coatingAnalytical chemistrychemistry.chemical_elementchemistry.chemical_compoundAtomic layer depositionMaterials ChemistryAtomic layer epitaxySilicon dioxideta318Thin filmta216ta116Plasma processingplasma-enhanced atomic layer depositionPlasma-enhanced atomic layer depositionsilicon dioxideconformal coatingta213ta114Atomic layer depositionbatch depositionIon platingMetals and AlloysPrecursorsSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistryatomic layer depositionprecursorsBatch depositionDeposition (chemistry)
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Mechanical and cohesion properties of brass plated steel cords in a sulphurizing environment

1986

The mechanical and cohesion properties of brass plated steel cords have been investigated in dry hydrogen sulphide between 25 and 450° C. The extents of elastic and plastic regions, obtained from slow strain rate technique data have been defined, and the preferential site of decohesion tends to be the brass-steel interface.

Mechanical propertyMaterials scienceCarbon steelMechanical EngineeringMetallurgyAdhesionengineering.materialHydrogen sulphideStrain rateBrassMechanics of Materialsvisual_artengineeringvisual_art.visual_art_mediumCohesion (geology)General Materials ScienceComposite materialElectroplatingJournal of Materials Science
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Helicates with Ether-Substituted Catechol Esters as Ligands

2020

European journal of organic chemistry 2020(32), 5161-5172 (2020). doi:10.1002/ejoc.202000843

Molecular switchCatecholesteritOrganic ChemistryEtherkompleksiyhdisteet540Combinatorial chemistrymolecular switchhelicatethermodynamicschemistry.chemical_compoundlitiumchemistrytermodynamiikkatemplatingddc:540supramolekulaarinen kemiacatecholatePhysical and Theoretical Chemistry
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An ion guide for the production of a low energy ion beam of daughter products of α-emitters

2006

A new ion guide has been modeled and tested for the production of a low energy ($\approx$ 40 kV) ion beam of daughter products of alpha-emitting isotopes. The guide is designed to evacuate daughter recoils originating from the $\alpha$-decay of a $^{233}$U source. The source is electroplated onto stainless steel strips and mounted along the inner walls of an ion guide chamber. A combination of electric fields and helium gas flow transport the ions through an exit hole for injection into a mass separator. Ion guide efficiencies for the extraction of $^{229}$Th$^{+}$ (0.06%), $^{221}$Fr$^{+}$ (6%), and $^{217}$At$^{+}$ (6%) beams have been measured. A detailed study of the electric field and …

Nuclear and High Energy PhysicsIon beam010308 nuclear & particles physicsChemistrySeparator (oil production)Ion gun01 natural sciences7. Clean energy3. Good healthIonIon beam depositionElectric field0103 physical sciencesAlpha decayAtomic physics010306 general physicsElectroplatingNuclear ExperimentInstrumentationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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