Search results for "Sputter deposition"

showing 3 items of 93 documents

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

2018

A comparative study of mechanical properties and elemental and structural composition was made for aluminum nitride thin films deposited with reactive magnetron sputtering and plasma enhanced atomic layer deposition (PEALD). The sputtered films were deposited on Si (100), Mo (110), and Al (111) oriented substrates to study the effect of substrate texture on film properties. For the PEALD trimethylaluminum–ammonia films, the effects of process parameters, such as temperature, bias voltage, and plasma gas (ammonia versus N2/H2), on the AlN properties were studied. All the AlN films had a nominal thickness of 100 nm. Time-of-flight elastic recoil detection analysis showed the sputtered films t…

elastic moduliMaterials scienceta22102 engineering and technologySubstrate (electronics)mechanical propertiesNitride01 natural sciencesAtomic layer depositionSputtering0103 physical sciencesTexture (crystalline)Composite materialThin filmta216kemiallinen analyysiAlNsputter deposition010302 applied physicsta114Surfaces and InterfacesSputter deposition021001 nanoscience & nanotechnologyCondensed Matter PhysicsX-ray diffractionfysikaaliset ominaisuudetSurfaces Coatings and FilmsElastic recoil detectionmetrologythin filmsAtomic Layer DepositionmetrologiaALDmechanical testingchemical analysisaluminum nitridesputteringohutkalvot0210 nano-technologyJournal of Vacuum Science & Technology A
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Characterization of rhenium oxide films and their application to liquid crystal cells

2009

Rhenium trioxide exhibits high electronic conductivity, while its open cubic crystal structure allows an appreciable hydrogen intercalation, generating disordered solid phases, with protonic conductivity. Rhenium oxide thin films have been obtained by thermal evaporation of ReO3 powders on different substrates, maintained at different temperatures, and also by reactive magnetron sputtering of a Re metallic target. A comparative investigation has been carried out on these films, by using micro-Raman spectroscopy and x-ray diffraction. Two basic types of solid phases appear to grow in the films: a red metallic HxReO3 compound, with distorted perovskite structures, like in the bulk material, a…

structural and vibrational characterizationMaterials sciencePerrhenateInorganic chemistryGeneral Physics and Astronomychemistry.chemical_elementCrystal structureSputter depositionRheniumIndium tin oxidechemistry.chemical_compoundRhenium trioxidechemistryChemical engineeringLiquid crystalRhenium oxide filmsRhenium oxide films; structural and vibrational characterization; electro-optic response.electro-optic responsePerovskite (structure)Journal of Applied Physics
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<title>Electrochromism of W-oxide-based films: some theoretical and experimental results</title>

1995

We survey some recent work related to electrochromic W-oxide-based thin films. The electronic structure of cubic (perovskite) WO3 and HWO3 was calculated from first principles. It was found, among other things, that hydroxide formation was energetically favored. Experimental studies were made on films prepared by reactive magnetron sputtering in Ar + O2 with and without CF4 addition and substrate bias. Structural studies by atomic force microscopy, x-ray diffraction, infrared reflectance spectroscopy, and Raman spectroscopy indicated that the electron bombardment associated with a positive substrate bias led to grain growth and partial crystallization while maintaining a high density of W e…

symbols.namesakeMaterials scienceSputteringScanning electron microscopeElectrochromismAnalytical chemistrysymbolsSubstrate (electronics)Thin filmSputter depositionRaman spectroscopyPerovskite (structure)SPIE Proceedings
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