Search results for "Ultra"

showing 10 items of 4451 documents

Laser Beam Lithography For 3-D Surface Patterning

1993

A low power laser processing unit, for microlithographic applications on non-planar surfaces, is described. By combining proper laser beam handling, micropositioning, software control and surface coating techniques, a 5-axis robotic system for laser writing has been set up. Light from a He-Cd laser source is fiber-delivered to a writing head, which moves around a resist coated solid object. After exposure, traditional wet processing can be applied. The unit is capable of patterning metal films deposited on samples up to a size of 50x50x100 mm, with 5 micrometer spatial resolution. An application in 3-D circuit fabrication is presented.

Materials sciencebusiness.industryExtreme ultraviolet lithographyLaserLaser writing 3-D Laser LithographySettore ING-INF/01 - Elettronicalaw.inventionSurface coatingResistlawMultiple patterningOptoelectronicsPhotolithographybusinessNext-generation lithographyMaskless lithography
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Actinic inspection of sub-50 nm EUV mask blank defects

2007

A new actinic mask inspection technology to probe nano-scaled defects buried underneath a Mo/Si multilayer reflection coating of an Extreme Ultraviolet Lithography mask blank has been implemented using EUV Photoemission Electron Microscopy (EUV-PEEM). EUV PEEM images of programmed defect structures of various lateral and vertical sizes recorded at around 13 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps enhancing the visibility of the edges of the phase defects which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.

Materials sciencebusiness.industryExtreme ultraviolet lithographyMask inspectionlaw.inventionStanding wavePhotoemission electron microscopyWavelengthOpticslawExtreme ultravioletOptoelectronicsPhotolithographyPhotomaskbusiness23rd European Mask and Lithography Conference
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Inspection of EUVL mask blank defects and patterned masks using EUV photoemission electron microscopy

2008

We report on recent developments of an "at-wavelength" full-field imaging technique for inspection of multilayer mask blank defects and patterned mask samples for extreme ultraviolet lithography (EUVL) by EUV photoemission electron microscopy (EUV-PEEM). A bump-type line defect with a width of approximately 35nm that is buried beneath Mo/Si multilayer has been detected clearly, and first inspection results obtained from a patterned TaN absorber EUVL mask sample is reported. Different image contrast of a similar width of multilayer-covered substrate line defect and on top TaN absorber square has been observed in the EUV-PEEM images, and origin of the difference in their EUV-PEEM image contra…

Materials sciencebusiness.industryExtreme ultraviolet lithographySubstrate (electronics)Condensed Matter PhysicsBlankAtomic and Molecular Physics and OpticsImage contrastSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionPhotoemission electron microscopyOpticslawOptoelectronicsElectrical and Electronic EngineeringPhotolithographyElectron microscopebusinessLine (formation)Microelectronic Engineering
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Influence of laser beam profile on the generation of ultrasonic waves

2011

The different ultrasonic fields generated in metallic materials by a laser beam with flat and Gaussian profile are investigated experimentally and using the finite element method (FEM). A high power laser beam irradiating a solid surface produces elastic waves with a mechanics that depends on many parameters, including the profile of the laser beam. The influence of the beam profile is investigated with the FEM analysis, considering the temperature dependence of material properties.

Materials sciencebusiness.industryGaussianGeneral ChemistryBeam parameter productFinite element methodLaser ultrasound ultrasonic wavessymbols.namesakeOpticssymbolsPhysics::Accelerator PhysicsGeneral Materials ScienceUltrasonic sensorLaser beam qualitybusinessMaterial propertiesBeam (structure)Longitudinal waveApplied Physics A
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Optical thermal filters for eXTP: manufacturing and characterization

2020

In order to ensure the effective detection of X-ray astronomical detectors by blocking ultraviolet, visible and infrared light, adding optical thermal filter in front of the load is an effective method. According to the scientific requirements of eXTP, optical thermal filters with aluminized polyimide (PI) film structure had been designed and tested in this paper, the results of mechanical tests including burst pressure, vibration and acoustic tests, also the transparent properties of optics in UV, Vis and IR lights are presented. The mechanical test results show that the filters for LAD and SFA can't pass the acoustic tests, causing the thickness of PI should be increased or a nickel mesh …

Materials sciencebusiness.industryInfraredDetectorFilter (signal processing)Acoustic testmedicine.disease_causeVibrationSettore FIS/05 - Astronomia E AstrofisicaBurst pressureTransparent propertyTransmission (telecommunications)Vibration testThermalOptical thermal filtermedicineOptoelectronicsbusinessUltravioletPolyimideSpace Telescopes and Instrumentation 2020: Ultraviolet to Gamma Ray
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Autofluorescence spectroscopy of cutaneous neoplasia under ultraviolet, visible and near infrared excitation

2020

We investigated melanin-pigmented skin samples ex vivo, of benign and dysplastic nevi, as well as malignant melanoma, obtained after surgical excision, containing so called safety areas, where a normal skin could be observed, to obtain a complex and complete view about the feasibility of different excitation sources solely and/or in combination to induce fluorescence signal useful for diagnosis of pigmented cutaneous neoplasia. Using the specialized multispectral analysis of the data obtained by fluorescence using excitation in broad spectral range, covering ultraviolet, visible and near-infrared spectral range, contribute considerably to the both the fundamental determination of tumour tis…

Materials sciencebusiness.industryMultispectral imageLasermedicine.disease_causeFluorescenceSpectral linelaw.inventionAutofluorescenceWavelengthOpticslawmedicinebusinessExcitationUltravioletTissue Optics and Photonics
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Ultrafast buffering by molecular gas

2011

A simple molecular gas sample can be used to achieve ultrafast optical buffering in two-dimensional optical imaging, thus serving as a promising extension of the well-developed liquid-crystal display technology.

Materials sciencebusiness.industryPhysics::Optics02 engineering and technology010402 general chemistry021001 nanoscience & nanotechnology01 natural sciencesSample (graphics)Atomic and Molecular Physics and Optics0104 chemical sciencesElectronic Optical and Magnetic MaterialsOptical imagingOpticsOptoelectronics0210 nano-technologybusinessUltrashort pulseNature Photonics
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Feedback Biasing Based Adjustable Gain Ultrasound Preamplifier for CMUTs in 45nm CMOS

2018

As CMOS technology is scaled down, supply voltages are decreasing and intrinsic gain of the nanoscale CMOS transistors is dropping while the threshold voltages of transistors are remaining relatively constant. In such scaled down nanoscale CMOS technologies, conventional vertical stacking architectures (for example. cascode architectures) for high-gain becomes no more attractive. In this paper we present the analysis and design of a feedback biasing based adjustable gain ultrasound preamplifier which is capable of amplifying signals from 15 MHz to 45 MHz from Capacitive Micromachined Ultrasound Transducers (CMUTs) in 45nm CMOS technology for medical ultrasound imaging applications. From the…

Materials sciencebusiness.industryPreamplifierCapacitive sensing020208 electrical & electronic engineeringTransistor020206 networking & telecommunicationsBiasing02 engineering and technologylaw.inventionCapacitive micromachined ultrasonic transducersCMOSlawHardware_INTEGRATEDCIRCUITS0202 electrical engineering electronic engineering information engineeringOptoelectronicsCascodebusinessVoltage2018 31st International Conference on VLSI Design and 2018 17th International Conference on Embedded Systems (VLSID)
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Ultrafast laser-induced micro-explosion: material modification tool

2016

Femtosecond Bessel pulses with a needle-like intensity distribution were focused inside sapphire crystal to create voids and the shock-wave affected volume which is by more than two orders of magnitude larger as compared with that made by the Gaussian pulse.

Materials sciencebusiness.industryScanning electron microscopePhysics::OpticsLaserlaw.inventionCrystalsymbols.namesakeOpticslawFemtosecondsymbolsSapphirebusinessUltrashort pulseOrder of magnitudeBessel functionPhotonics and Fiber Technology 2016 (ACOFT, BGPP, NP)
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750 mW continuous-wave solid-state deep ultraviolet laser source at the 253.7 nm transition in mercury.

2007

A high-power continuous-wave coherent light source at 253.7 nm is described. It is based on a solid-state Yb:YAG disk laser with two successive frequency doubling stages and is capable of generating stable output powers of up to 750 mW. Spectroscopy of the 6 (1)S(0)-6 (3)P(1) transition of mercury has been demonstrated.

Materials sciencebusiness.industrySecond-harmonic generationNonlinear opticsmedicine.disease_causeLaserAtomic and Molecular Physics and OpticsSemiconductor laser theorylaw.inventionOpticslawmedicineContinuous waveOptoelectronicsDisk laserbusinessSpectroscopyUltravioletOptics letters
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