Search results for "Wavelength range"

showing 4 items of 14 documents

uality Evaluation of “Tardivo di Ciaculli” Mandarins in Post-Harvest Processing on an Industrial Scale Using a Portable Vis/NIR Device

2016

Abstract. Vis/NIR technology is widely used today to quickly and non-destructively evaluate fruit and vegetable qualities, and many applications have been found since the 1990s. However, no industrial-scale applications can further consolidate the use of non-destructive techniques in post-harvest processing. This study aims to test the possibility of applying vis/NIR technology in a modern citrus-processing plant to assess the damage that the fruits eventually suffer when they are processed on an industrial scale and the evolution of their key quality parameters in a period of 10 days after harvest. The spectral acquisitions were performed using a portable vis/NIR device, which operated in …

Settore SECS-S/02 - Statistica Per La Ricerca Sperimentale E TecnologicaWavelength rangeMandarinPost-harvestIndustrial scaleSettore AGR/09 - Meccanica AgrariaBiomedical EngineeringSoil ScienceForestry04 agricultural and veterinary sciences040401 food scienceTotal variabilitySettore AGR/03 - Arboricoltura Generale E Coltivazioni ArboreeHorticulture0404 agricultural biotechnologyProcessing plantSoluble solidsAgronomy and Crop ScienceVis/NIRFood ScienceMathematicsBiomedical engineeringTransactions of the ASABE
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Low-cost high-haze films based on ZnO nanorods for light scattering in thin c-Si solar cells

2015

Light scattering from ZnO nanorods (NR) is investigated, modeled, and applied to a solar cell. ZnO NR (120-1300 nm long, 280-60 nm large), grown by low-cost chemical bath deposition at 90 degrees C, exhibit diffused-to-total transmitted light as high as 70% and 30% in the 400 and 1000 nm wavelength range, respectively. Data and scattering simulation show that ZnO NR length plays a crucial role in light diffusion effect. A transparent ZnO NR film grown on glass and placed on top of a 1 mu m thick c-Si solar cell is shown to enhance the light-current conversion efficiency for wavelengths longer than 600 nm. (C) 2015 AIP Publishing LLC.

SiliconMaterials sciencePhysics and Astronomy (miscellaneous)SiliconZnO nanorod Silicon solar cellschemistry.chemical_elementNanorodSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaLight scatteringlaw.inventionlawSolar cellZinc oxide C-Si solar cellChemical-bath depositionbusiness.industryScatteringSolar cellEnergy conversion efficiencyWide-bandgap semiconductorLight scatteringCurrent conversion efficiencychemistryLight diffusionScattering simulationOptoelectronicsNanorodTransmitted lightbusinessWavelength rangeChemical bath depositionApplied Physics Letters
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Evaluation of Skin Melanoma in Spectral Range 450-950 nm Using Principal Component Analysis

2013

Diagnostic potential of principal component analysis (PCA) of multi-spectral imaging data in the wavelength range 450-950 nm for distant skin melanoma recognition is discussed. Processing of the measured clinical data by means of PCA resulted in clear separation between malignant melanomas and pigmented nevi.

medicine.medical_specialtyMaterials scienceintegumentary systemWavelength rangebusiness.industryMelanomamedicine.diseaseImaging dataSpectral imagingOpticsNuclear magnetic resonancePrincipal component analysisPigmented NevusmedicineSkin melanomabusinessneoplasms
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Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source

2017

Photoelectron emission measurements have been performed using a 2.45 GHz ECR-driven multi-dipolar plasma source in a low pressure hydrogen discharge. Photoelectron currents induced by light emitted from ECR zone and H− production region are measured from Al, Cu, Mo, Ta, and stainless steel (SAE 304) surfaces as a function of microwave power and neutral hydrogen pressure. The total photoelectron current from the plasma chamber wall is estimated to reach values up to 1 A for 900 W of injected microwave power. It is concluded that the volumetric photon emission rate in wavelength range relevant for photoelectron emission is a few times higher in arc discharge. peerReviewed

plasma sourcesta114HydrogenWavelength rangeChemistryPhysics::Instrumentation and DetectorssyklotronitMicrowave powerAnalytical chemistrychemistry.chemical_elementPlasmaplasmatekniikkaelektronitIonElectric arcECR ion sourcesDipolePhysics::Plasma PhysicsPhysics::Atomic and Molecular ClustersphotoelectronsCurrent (fluid)Atomic physicsemissio (fysiikka)
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