Search results for "etching"
showing 10 items of 186 documents
Power ultrasound irradiation during the alkaline etching process of the 2024 aluminium alloy
2015
Abstract Prior to any surface treatment on an aluminum alloy, a surface preparation is necessary. This commonly consists in performing an alkaline etching followed by acid deoxidizing. In this work, the use of power ultrasound irradiation during the etching step on the 2024 aluminum alloy was studied. The etching rate was estimated by weight loss, and the alkaline film formed during the etching step was characterized by glow discharge optical emission spectrometry (GDOES) and scanning electron microscope (SEM). The benefit of power ultrasound during the etching step was confirmed by pitting potential measurement in NaCl solution after a post-treatment (anodizing).
One-step formation of nanostructures on silicon surfaces using pure hydrogen-radical-initiated reactions
2013
One-step formation of silicon nanowires, sheets, and texture surface on a silicon substrate has been achieved using hydrogen-radical etching reactions. Metallic tungsten and for comparison purposes a tungsten hot wire, were used as catalysts for the hydrogen-molecular cracking. It was shown that a variety of surface structures on silicon such as inverted pyramid texture, V-groove texture, dense silicon nanowire growth over texture, and nanosheet structure can be obtained by controlling the process conditions. The obtained results suggested that the formation of nanotungsten silicide particle is an essential prerequisite to obtain these structures. The particles work as an etching mask again…
Some morphologic changes induced by Nd:YAG laser on the noncoated enamel surface: A scanning electron microscopy study
1992
The enamel surface layer of some human teeth was treated with the low-energy Nd:YAG laser at 8 mJ pulse energy. These samples were previously etched with 0.05 M orthophosphoric acid to reduce the surface reflection. The treated samples, as well as the control samples, were widely studied by scanning electron microscopy, and, in the lased group, significant morphologic changes affecting the enamel surface were observed. Those changes reveal principally the loss of the typical surface structure of the acid-etched enamel. The hydroxyapatite prisms were not discernible, and there was a decrease in the roughness of the lased surface enamel. These laser-induced structural changes may be related t…
Ultra-structure characterization of self-etching treated cementum surfaces
2010
Objectives: to evaluate the effect of different conditioning treatments on surface roughness and topography of dental cementum. Study Design: Extracted human canines were used for the present study. The mesial surface from the cervical third of the roots were ground flat with wet 600-grit silicon carbide paper. They were polished (up to 1/4 µm diamond paste) and treated as follows: 1) No treatment, 2) 35% H3PO4 during 15 s, 3) Clearfil SE Bond primer (SEB), 4) One-Up Bond F (OUB). The adhesive systems were applied following manufacturer?s instructions. SEB primer and OUB were removed from surfaces by washing and ultrasonic agitation with ascending ethanol solutions. Digital images of treate…
<title>Relief holographic recording in amorphous As-S-Se</title>
2003
The relief-phase holographic gratings in amorphous As-S-Se thin films were recorded and studied. The holographic recording was performed by He-Ne laser (0.6328 μm). The influence of etching and cohernet self-enhancement processes on the formation of surface relief in amorphous As-S-Se thin films was studied.© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Exploring 10 Gb/s transmissions in Titanium dioxide based waveguides at 1.55 pm and 2.0 pm
2017
Exploring new spectral bands for optical transmission is one of the solutions to support the increasingly demand of data traffic. The recent development of dedicated hollow-core photonic bandgap fibers [1], associated to the emergence of thulium doped fiber amplifiers [2] has recently focused the attention further in the infrared, and more specifically around 2 μm. Regarding integrated photonics, it becomes therefore interesting to find a suitable platform to operate at 2 μm as well as in the other more conventional spectral bands (going from 800 nm to 1550 nm). Here, we propose titanium dioxide (TiO 2 ) as a good candidate for integrated waveguide photonics and demonstrate, for the first t…
Suppression of leakage currents in GaN-based LEDs induced by reactive-ion etching damages
2008
Forward and reverse leakage currents in GaN/InGaN multi-quantum well light-emitting diodes (LEDs) are caused by reactive-ion etching (RIE) damages during device patterning. A method to recover the damaged surfaces, based on a chemical etch in KOH: ethylene-glycol is described. Leakage currents decrease of more than a factor of 10 and are completely suppressed in most of devices.
Polymer based tuneable photonic crystals
2007
We report on the fabrication and characterization of photonic crystal slab waveguide resonators which contain a nanostructured second-order nonlinear optical polymer. The combination of a photonic crystal resonator realized in a second-order nonlinear optical polymer allowed the detection of electro-optical modulation of light with a sub-1-V sensitivity. Furthermore we report on the synthesis of novel nonlinear optical polymers with large second-order hyperpolarizability and improved glass transition temperature. The polymer slab waveguide is micro patterned by means of electron-beam lithography and reactive ion etching. The photonic crystal slab-based resonator consisted of a square lattic…
Texturing of Indium Phosphide for Improving the Characteristics of Space Solar Cells
2021
This paper discusses and demonstrates the usefulness and prospects of using textured layers of indium phosphide as a material for space solar cells. Such designs improve the performance of the photovoltaic converter by increasing the effective area and surface roughness. Thus, it minimizes the background reflectivity of the surface. Textured layers on the InP surface were obtained by electrochemical etching using a bromous acid solution.
Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography
2011
The lithographic exposure characteristic of amorphous silica (SiO2) was investigated for 6.8 MeV16O3+ions. A programmable proximity aperture lithography (PPAL) technique was used for the ion beam exposure. After exposure, the exposed pattern was developed by selective etching in 4% v/v HF. Here, we report on the development of SiO2in term of the etch depth dependence on the ion fluence. This showed an exponential approach towards a constant asymptotic etch depth with increasing ion fluence. An example of microfluidic channels produced by this technique is demonstrated.