Search results for "force microscopy"

showing 10 items of 247 documents

Application of atomic and nuclear techniques to the study of inhomogeneities in electrodeposited α-particle sources

2002

Three α-particle sources made by different methods of electrodeposition were analysed using α-particle spectrometry, Rutherford backscattering (RBS), and atomic force microscopy (AFM) on several surface zones. The thickness and homogeneity of these sources was studied using RBS, and the results were analysed jointly with those obtained with α-particle spectrometry and AFM techniques. The comparison of the electrodeposition methods showed that the most homogeneous electrodeposited zones corresponded to the source made with a stirring cathode.

Nuclear and High Energy PhysicsChemistrylawHomogeneousAtomic force microscopyHomogeneity (physics)Analytical chemistryMass spectrometryInstrumentationα particlesCathodelaw.inventionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Nanostructuring and strengthening of LiF crystals by swift heavy ions: AFM, XRD and nanoindentation study

2012

Abstract Modifications of the structure and micromechanical properties of LiF crystals under high-fluence irradiation (10 11 –10 13  ions cm −2 ) with swift C, Ti, Au and U ions of the specific energy of 11.1 MeV/u have been studied. In the case of heavy ions (U, Au), the AFM and SEM results reveal the bulk nanostructure consisting of columnar grains with nano-scale dimensions (50–100 nm). For lighter C ions the structure enriched with prismatic dislocation loops has been observed. High-resolution XRD reciprocal space maps for nano-structured LiF expose a mosaic-type structure with low-angle boundaries between grains.

Nuclear and High Energy PhysicsCrystallographyReciprocal latticeMaterials scienceNanostructureAtomic force microscopySpecific energyIrradiationNanoindentationDislocationInstrumentationIonNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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MeV–GeV ion induced dislocation loops in LiF crystals

2014

Abstract Formation of prismatic dislocation loops and evolution of dislocation structure in LiF crystals irradiated with swift 238U and 36S ions of specific energy 11 MeV/u at fluences up to 1013 ions cm−2 has been investigated using chemical etching and AFM. It has been shown that prismatic dislocations are formed in the stage of track overlapping above threshold fluences Φ ≈ 109 U cm−2 and Φ ≈ 1010 S cm−2. The diameter of dislocation loops reaches 600–1000 nm for 238U ions and 200 nm for 36S ions. The dislocations created by 238U ions are arranged in rows along the direction of ion beam, whereas 36S ions create freely distributed dislocation loops each of them being oriented along the ion…

Nuclear and High Energy PhysicsMaterials scienceIon beamAtomic force microscopyHardening (metallurgy)Specific energyIrradiationDislocationAtomic physicsInstrumentationIsotropic etchingIonNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Smooth crack-free targets for nuclear applications produced by molecular plating

2013

The production process of smooth and crack-free targets by means of constant current electrolysis in organic media, commonly known as molecular plating, was optimized. Using a Nd salt, i.e., [Nd(NO3)(3)center dot 6H(2)O], as model electrolyte several constant current density electrolysis experiments were carried out to investigate the effects of different parameters, namely the plating solvent (isopropanol and isobutanol mixed together, pyridine, and N,N-dimethylformamide), the electrolyte concentration (0.11, 0.22, 0.44 mM), the applied current density (0.17, 0.3, 0.7, and 1.3 mA/cm(2)), and the surface roughness of the deposition substrates (12 and 24 nm). Different environments (air and …

Nuclear and High Energy PhysicsspectroscopyScanning electron microscopeX-ray photoelectronAnalytical chemistrychemistry.chemical_elementElectrolytegamma-ray spectroscopy; Atomic force microscopy (AFM); Molecular plating; Neodymium; Smooth crack-free targets; X-ray photoelectron spectroscopy (XPS)Neodymium530law.inventionSmooth crack-free targetsNuclear magnetic resonanceX-ray photoelectron spectroscopylawSurface roughnessgamma-raySpectroscopyInstrumentationPhysicsNeodymiumElectrolysisspectroscopy (XPS)X-ray photoelectron spectroscopy (XPS)Molecular platingchemistrygamma-ray spectroscopyAtomic force microscopy (AFM)Current density
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Stability/Instability of Conductivity and Work Function Changes of ITO Thin Films, UV-Irradiated in Air or Vacuum. Measurements by the Four-Probe Met…

2001

This study shows that, after UV-irradiation in air or vacuum, conductivity and work function of ITO and In2O3 come back to their initial values in a few hours or minutes. In addition to this instability, one of the reported drawbacks of ITO is the indium diffusion into the organic layers of operating LED, leading to performance degradation. So, we have reconsidered ITO as transparent anode and explored alternatives such as NiO.

OLED Pulsed laser deposition Kelvin force microscopy Work function
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Mechanical and electroconductive properties of spatially distributed double stranded DNA arrays on Au (111)

2008

Abstract Conductive AFM was used to investigate electroconductivity through 10 nm long double stranded DNA molecules in mixed monolayers of thioalkylated-DNA and mercaptohexanol (MCH) on Au (111) surface. The distribution of DNA molecules on the surface was analyzed by tapping mode AFM. Measurements performed in lift mode confirmed that the DNA molecules protrude from the surface rather than lie horizontally adsorbed on the interface. The optimal conductivity measurement time, which is shorter than the mechanical relaxation time of oligonucleotide duplexes, was determined. It was concluded that oligonucleotide duplexes have a resistance of the order of ~ 2 Ω ⁎ m at 1 V.

OligonucleotideMetals and AlloysAnalytical chemistrySelf-assembled monolayerSurfaces and InterfacesConductive atomic force microscopyConductivitySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCrystallographychemistry.chemical_compoundAdsorptionchemistryMonolayerMaterials ChemistryMoleculeDNAThin Solid Films
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Nanoscale control in organic bulk heterojunctions of new set of materials for photovoltaic applications

2008

Organic PhotovoltaicScanning Force Microscopy (SFM)Solar EnergyConductive Polymers
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Boramers for Photovoltaic Applications

2008

Organic PhotovoltaicScanning Force Microscopy (SFM)Solar EnergyConductive Polymers
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Structural, electronic, and electrical properties of an Undoped n-Type CdO thin film with high electron concentration

2014

Transparent conducting metal oxides (TCOs) combine the properties of optical transparency in the visible region with a high electrical conductivity. They are a critical component as the window electrode in liquid crystal and electroluminescent display devices, as well as in many designs of solar cells now under development. Sn-doped In2O3 is currently the most important TCO, but it suffers from some drawbacks. These include the high cost of indium, weak optical absorption in the blue-green region, as well as chemical instability that leads to corrosion phenomena in organic light-emitting devices. Indium tin oxide (ITO) films are also brittle and of relatively low durability. A number of oth…

Organic light-emitting devices Optical propertiesMaterials scienceDisplay deviceElectroluminescent display deviceHigh electron concentrationCdO; semiconductor; TCOchemistry.chemical_elementChemical vapor depositionAtomic force microscopyElectric conductivityElectrical resistivity and conductivityChemical vapor depositionLight absorptionThin filmPhysical and Theoretical ChemistryThin filmCdOHigh electrical conductivitybusiness.industryDegenerate semiconductorFree electron concentrationsemiconductorSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsIndium tin oxideElectroluminescent displayPhotoelectron spectroscopyGeneral EnergychemistryLiquid crystalTCOTinElectrodeOptoelectronicsX ray diffraction Conducting metal oxidebusinessTinLuminescence measurementIndium
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Surface investigation of plasma HMDSO membranes post-treated by CF4/Ar plasma

2002

Fluorination treatment has been performed on polysiloxane membranes using a plasma glow discharge of a gases mixture CF4 and argon (plasma enhanced chemical vapor deposition). Atomic force microscopy, XPS analyses and contact angle measurements have been undertaken to explain the surface transformation and behavior, which strongly depend on the morphology, the composition and the hydrophilic/hydrophobic character of the plasma-polymerized initial membranes. Main result is that fluorination, which leads to hydrophobic membranes, has a more relevant effect on amorphous silica-like membranes than on polymer-like ones, according to their chemical composition whereas the plasma surface reaction …

PECVDAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_elementsurface treatments02 engineering and technologySKIN LAYER01 natural sciencesContact angleX-ray photoelectron spectroscopyPlasma-enhanced chemical vapor deposition0103 physical sciencesXPSmembranecontact angle010302 applied physicsGlow dischargeArgonFORCE MICROSCOPYSurfaces and InterfacesGeneral ChemistryPlasma[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsTRANSPORTSurfaces Coatings and FilmsAmorphous solidMembranechemistryGAS[ CHIM.MATE ] Chemical Sciences/Material chemistryAFM0210 nano-technology
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