Search results for "interfaces"

showing 10 items of 1258 documents

The defined adsorption site of sodium on the TiO2(110)–(1×1) surface

2004

The adsorption site of sodium on the TiO2(1 1 0)–(1 × 1) surface was studied by extended X-ray absorption fine structure. For coverage ranging between 0.25 and 0.5 ML, we find that sodium is on an ‘in-between' site where it is bound to two bridging oxygen atoms at 2.25 Å and one in-plane oxygen atom at 2.40 Å, in full agreement with DFT calculations. At higher coverage the site becomes an hollow site where the sodium atom is equidistant to the three oxygen atoms at 2.30 Å, while metallic sodium clusters are also formed at the surface.

Alkali metalsSodiumInorganic chemistrychemistry.chemical_element02 engineering and technologyExtended X-ray absorption fine structure (EXAFS)01 natural sciencesOxygenMetalAdsorption0103 physical sciencesAtomMaterials Chemistry010306 general physicsTitanium oxideExtended X-ray absorption fine structureChemistrySurfaces and Interfaces021001 nanoscience & nanotechnologyCondensed Matter PhysicsAlkali metalSurfaces Coatings and FilmsCrystallographyvisual_artvisual_art.visual_art_mediumAbsorption (chemistry)0210 nano-technologySurface Science
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Synthesis and characterisation of pack cemented aluminide coatings on metals

2004

Abstract The exposition of metallic materials to high temperature environments leads to their corrosion because of oxidation or sulphidation. One way to protect such materials is to produce an Al 2 O 3 layer which needs to be continuous enough to limit diffusion of oxygen or metallic elements, and withstand this corrosion. Since a few years, it has been proved that aluminide compounds are one of the most effective materials to achieve this goal. Indeed, they possess sufficient Al and many beneficial mechanical properties when exposed to high temperature conditions to make possible the formation of a protective Al 2 O 3 scale. This study is aimed at the elaboration of iron, nickel and molybd…

Aluminium oxidesMaterials scienceMetallurgyGeneral Physics and Astronomychemistry.chemical_elementSurfaces and InterfacesGeneral Chemistryengineering.materialCondensed Matter PhysicsSurfaces Coatings and FilmsCorrosionchemistryCoatingCementation processAluminiumengineeringSurface modificationLayer (electronics)AluminideApplied Surface Science
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Templated growth of smart coatings: Hybrid chemical vapour deposition of vanadyl acetylacetonate with tetraoctyl ammonium bromide

2009

Hybrid aerosol assisted and atmospheric pressure chemical vapour deposition methodology has been utilised to produce thin films of vanadium dioxide from vanadyl acetylacetonate. Tetraoctyl ammonium bromide (TOAB) was used in the aerosol precursor solution. The films were analysed by X-ray diffraction, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy. Their optical and thermochromic behaviour was also determined. It was found that the use of TOAB had a templating effect that led to a halving in the particle size and that this consequently led to a significant decrease in the thermochromic transition temperature of the films to 34 8C.

Ammonium bromideMaterials scienceScanning electron microscopeInorganic chemistryGeneral Physics and AstronomyVanadiumchemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryChemical vapor depositionCondensed Matter PhysicsSurfaces Coatings and FilmsThermochromic thin film Chemical vapor deposition CVDchemistry.chemical_compoundchemistryTransition metalX-ray photoelectron spectroscopyVanadyl acetylacetonateThin filmApplied Surface Science
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Crystallization kinetics of amorphous SiC films: Influence of substrate

2005

Abstract The crystallization kinetics of amorphous silicon carbide films was studied by means of X-ray diffractometry (XRD) and transmission electron microscopy (TEM). The films were deposited by radio frequency (r.f.) magnetron sputtering on glassy carbon and single crystalline silicon substrates, respectively. TEM micrographs and XRD patterns show the formation of nano-crystalline β-SiC with crystallite sizes in the order of 50 nm during annealing at temperatures between 1200 and 1600 °C. A modified Johnson–Mehl–Avrami–Kolmogorov (JMAK) formalism was used to describe the isothermal transformation of amorphous SiC into β-SiC as an interface controlled, three-dimensional growth processes fr…

Amorphous siliconMaterials scienceSiliconGeneral Physics and Astronomychemistry.chemical_elementGlassy carbonlaw.inventionchemistry.chemical_compoundsilicon carbidelawcrystallization kineticsCrystalline siliconCrystallizationsputter depositionSurfaces and InterfacesGeneral ChemistrySputter depositionCondensed Matter PhysicsSurfaces Coatings and FilmsAmorphous solidamorphous filmsCrystallographychemistryChemical engineering[ CHIM.MATE ] Chemical Sciences/Material chemistryCrystalliteApplied Surface Science
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Influence of the electro-optical properties of an a-Si:H single layer on the performances of a pin solar cell

2012

We analyze the results of an extensive characterization study involving electrical and optical measurements carried out on hydrogenated amorphous silicon (α-Si:H) thin film materials fabricated under a wide range of deposition conditions. By adjusting the synthesis parameters, we evidenced how conductivity, activation energy, electrical transport and optical absorption of an α-Si:H layer can be modified and optimized. We analyzed the activation energy and the pre-exponential factor of the dark conductivity by varying the dopant-to-silane gas flow ratio. Optical measurements allowed to extract the absorption spectra and the optical bandgap. Additionally, we report on the temperature dependen…

Amorphous siliconThin film materialThin film solar cell Activation energySingle junctionConductivitySettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionchemistry.chemical_compoundElectric conductivitylawMaterials ChemistryThin filmAbsorption (electromagnetic radiation)Preexponential factorGas-flow ratioMetals and AlloysSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsTemperature dependenceHydrogenated amorphous siliconOptoelectronicsElectric propertieQuantum efficiencyHydrogenationOptical data processingDeposition conditionSiliconMaterials scienceActivation energyQuantum efficiencySynthesis conditionVapor deposition SiliconOpticsSolar cellActivation energyDark conductivityCharacterization studieElectromagnetic wave absorptionThin filmDepositionElectrooptical propertieThin film solar cellConductivitybusiness.industryEnergy conversion efficiencySolar cellAmorphous siliconMeyer-Neldel ruleOptical propertieOptical measurementelectro-optical propertiesNanostructured materialSilicon; Solar cell; electro-optical propertiesElectrical transportchemistrySynthesis parameterOptical variables measurementSingle layerConversion efficiencybusinessOptical gap
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Low vacuum photo electron emitting thin films

2009

Impact ionisation is a standard procedure to ionise gaseous or vaporisable substances in organic mass spectrometry. In this work, a "softer" ionisation is introduced which seems to be an alternative ion source for reducing collision between substance molecules and the hot internal walls of the box. Through collision mainly found in impact ionisation sources, fragments are built especially from thermally sensitive substances falsifying the spectra. We present here photoelectron emitting materials for the soft ionisation using semiconducting compounds, galliumn nitride (GaN), and a representative of the borides, lanthanum hexaboride (LaB 6 ). They are evaluated by photoelectron spectroscopic …

Analytical chemistryGallium nitrideSurfaces and InterfacesElectronLanthanum hexaborideNitrideCondensed Matter PhysicsMass spectrometryIon sourceSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistry.chemical_compoundchemistryIonizationMaterials ChemistryElectrical and Electronic EngineeringThin filmphysica status solidi (a)
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Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS

2001

Abstract TiN(O)–TiO 2 thin films were prepared on Si(1 0 0) by the low pressure organo metallic chemical vapor deposition (LP-OMCVD) method, using ammonia and titanium isopropoxide as precursors. In order to complete previous characterizations, an Ar + bombardment/XPS coupled study was carried out. This method is based on the fact that the behavior of a compound towards an ion bombardment is a function of its composition. In particular, Ar + bombardment of TiO 2 (whatever its form) leads to a preferential sputtering of oxygen atoms with subsequent reduction of titanium and formation of Ti 3+ and Ti 2+ easily detectable by XPS from a significant broadening of the Ti 2p lines. In the opposite…

Analytical chemistryGeneral Physics and Astronomychemistry.chemical_elementMineralogySurfaces and InterfacesGeneral ChemistryChemical vapor depositionCondensed Matter PhysicsSurfaces Coatings and FilmsAmorphous solidchemistry.chemical_compoundchemistryX-ray photoelectron spectroscopySputteringThin filmTitanium isopropoxideTinTitaniumApplied Surface Science
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Ellipsometric study of the physisorption of benzene on graphite

1987

The optical thickness of benzene on the (001) surface of a graphite single crystal has been studied by ellipsometry. Ellipsometric adsorption isotherms have been measured in the temperature range from 180 to 290 K. The maximum thickness of the adsorbed benzene film is constant in this temperature range and compares favourably with the value expected for one monolayer of molecules lying flat on the surface.

Analytical chemistryMineralogySurfaces and InterfacesAtmospheric temperature rangeCondensed Matter PhysicsSurfaces Coatings and Filmschemistry.chemical_compoundAdsorptionchemistryPhysisorptionEllipsometryMonolayerMaterials ChemistryGraphiteBenzeneSingle crystalSurface Science
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Reactive direct current magnetron sputtered TiO2 thin films with amorphous to crystalline structures.

2008

International audience; TiO2 thin films were deposited on soda–lime glass substrates by reactive direct current magnetron sputtering in a mixture of pure argon and oxygen. The influence of both the deposition time, td, and the post-annealing treatments on the films morphology, composition and structure was analyzed by scanning electron microscopy, ellipsometry, X-ray photoelectrons spectroscopy, X-ray diffraction (XRD) and Raman spectroscopy. Amorphous TiO2 was obtained for the shortest deposition time, td=15 min. Increasing td up to 30 min, poorly crystallized anatase and rutile phases were formed together with amorphous TiO2, as was revealed by complementary XRD patterns and Raman spectra…

AnataseMaterials scienceAnalytical chemistry02 engineering and technology01 natural scienceschemistry.chemical_compoundsymbols.namesakeEllipsometry0103 physical sciencesMaterials ChemistryThin filmMicrostructure010302 applied physicsMetals and AlloysSurfaces and Interfaces021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidX-ray diffractionCarbon filmchemistryPhysical vapor depositionTitanium dioxideRaman spectroscopysymbolsTitanium dioxide0210 nano-technologyRaman spectroscopyDC magnetron sputtering
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Study of surface layers and ejected powder formed by oxidation of titanium substrates with a pulsed Nd:YAG laser beam.

2009

Laser treatment of a titanium surface at certain conditions initiates the formation of titanium oxide layers as well as micro (nano) scale powder ejected from the surface of the substrate. The resultant morphology of the surface as well as the size and the structure of the particles are all strongly dependent on the treatment parameters (laser fluence, pulse frequency, overlap parameter, etc.). In this study, titanium substrates were treated with an industrial pulsed Nd:YAG laser in air, with varying parameters. Surface layers and ejected materials were compared using scanning and transmission electron microscopy, X-ray diffraction and Raman spectroscopy. The rutile phase of TiO(2) dominate…

AnataseMaterials scienceAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_element02 engineering and technology01 natural scienceslaw.inventionchemistry.chemical_compoundsymbols.namesakePlasmalaw0103 physical sciencesLaser treatments010302 applied physicstechnology industry and agricultureSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsLaserSurfaces Coatings and FilmsTitanium oxidechemistryRutileNd:YAG laserTitanium dioxidesymbolsTitanium dioxideNanoparticles0210 nano-technologyRaman spectroscopyTitanium
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