Search results for "lithography"
showing 10 items of 242 documents
Automatable sample fabrication process for pump-probe X-ray holographic imaging
2014
Soft X-ray holography is a recently developed imaging technique with sub-50 nm spatial resolution. Key advantages of this technique are magnetic and elemental sensitivity, compatibility with imaging at free electron laser facilities, and immunity to in-situ sample excitations and sample drift, which enables the reliable detection of relative changes between two images with a precision of a few nanometers. In X-ray holography, the main part of the experimental setup is integrated in the sample, which consequently requires a large number of fabrication steps. Here we present a generic design and an automatable fabrication process for samples suitable, and optimized for, efficient high resolut…
One-step large-scale deposition of salt-free DNA origami nanostructures
2015
AbstractDNA origami nanostructures have tremendous potential to serve as versatile platforms in self-assembly -based nanofabrication and in highly parallel nanoscale patterning. However, uniform deposition and reliable anchoring of DNA nanostructures often requires specific conditions, such as pre-treatment of the chosen substrate or a fine-tuned salt concentration for the deposition buffer. In addition, currently available deposition techniques are suitable merely for small scales. In this article, we exploit a spray-coating technique in order to resolve the aforementioned issues in the deposition of different 2D and 3D DNA origami nanostructures. We show that purified DNA origamis can be …
Superconducting tunnel junction fabrication on three-dimensional topography via direct laser writing
2020
Superconducting junctions are widely used in multitude of applications ranging from quantum information science and sensing to solid-state cooling. Traditionally, such devices must be fabricated on flat substrates using standard lithographic techniques. In this study, we demonstrate a highly versatile method that allows for superconducting junctions to be fabricated on a more complex topography. It is based on maskless direct laser writing (DLW) two-photon lithography, which allows writing in 3D space. We show that high-quality normal metal-insulator-superconductor (NIS) tunnel junctions can be fabricated on top of a 20 $\mu$m tall three-dimensional topography. Combined with more advanced r…
Configurable low-cost plotter device for fabrication of multi-color sub-cellular scale microarrays.
2014
We report on the construction and operation of a low-cost plotter for fabrication of microarrays for multiplexed single-cell analyses. The printing head consists of polymeric pyramidal pens mounted on a rotation stage installed on an aluminium frame. This construction enables printing of microarrays onto glass substrates mounted on a tilt stage, controlled by a Lab-View operated user interface. The plotter can be assembled by typical academic workshops from components of less than 15 000 Euro. The functionality of the instrument is demonstrated by printing DNA microarrays on the area of 0.5 squared centimeters using up to three different oligonucleotides. Typical feature sizes are 5 μm diam…
Bringing Plasmonics Into CMOS Photonic Foundries: Aluminum Plasmonics on Si$_{3}$N$_{4}$ for Biosensing Applications
2019
We present a technology platform supported by a new process design kit (PDK) that integrates two types of aluminum plasmonic waveguides with Si $_{3}$ N $_{4}$ photonics towards CMOS-compatible plasmo-photonic integrated circuits for sensing applications. More specifically, we demonstrate the fabrication of aluminum slot waveguide via e-beam lithography (EBL) on top of the Si $_{3}$ N $_{4}$ waveguide and an optimized fabrication process of aluminum plasmonic stripe waveguides within a CMOS foundry using EBL. Experimental measurements revealed a propagation length of 6.2 μm for the plasmonic slot waveguide in water at 1550 nm, reporting the first ever experimental demonstration of a plasmon…
Multilevel pattern generation by GaN laser lithography: an application to beam shaper fabrication
2006
The new GaN lasers represent a unique combination of compactness, reliability, energy efficiency, and short wavelength. With respect to the previous state of the art in direct laser write lithography, based on gas lasers, this is resulting in a breakthrough, and is opening the way to real desktop micropatterning. The field of diffractive optics can immediately benefit by the availability of a new breed of pattern generators, based on such sources, mainly for fast turnaround device development. This paper presents the technical advantages involved in the use of 405 nm GaN lasers for one-step multilevel patterning. Beam modulation, exposure control and overall process strategy are discussed. …
Nonstoichiometric silica mask to fabricate reverse proton-exchange waveguides in lithium niobate crystals
2004
Producing channel waveguides requires a photolithographic mask, but the standard technique of using thermally evaporated metal films for proton exchange has proved to be unsuitable for withstanding the rather aggressive process of reverse proton exchange. We report the fabrication of a nonstoichiometric silica mask by ion-plating plasma-assisted deposition. This mask is strong enough to resist both direct and reverse proton exchange and is also compatible with anisotropic dry etching for patterning the mask and with electric field poling. Our technique is a practical alternative to the use of SiO2 sputtered masks.
Nanofabrication of TaS2 conducting layers nanopatterned with Ta2O5 insulating regions via AFM
2013
It is demonstrated how local oxidation nanolithography performed with an atomic force microscope (AFM-LON) may be successfully employed for the nanopatterning of insulating regions of Ta2O5 on TaS2 ultrathin metallic layers. This provides a simple approach for the fabrication of electronic devices, such as single-electron transistors, at the nanoscale.
Nanostructured molecular surfaces: advances in investigation and patterning tools
2009
This feature article is aimed to showcase advanced soft and radiationless nanotools for the morphological characterization and for the preparation/modification of molecular surfaces, namely solid supported ultrathin films not exceeding 1–2 molecular layers. As to the characterization, the development of dynamic scanning force microscopy in attractive regime is presented as an important progress at least as far as it concerns imaging of nanoscale features of molecular surfaces with minimal probe–sample physical interaction. To date, this tool has been applied only by a few groups in spite of its larger resolution and image quality than the conventional scanning probe methods. As to the prepa…
Large-scale Nanopatterning of Single Proteins used as Carriers of Magnetic Nanoparticles
2010
4 páginas, 4 figuras.