Search results for "microfabric"

HCl gas gettering of low-cost silicon

2013

HCl gas gettering is a cheap and simple technique to reduce transition metal concentrations in silicon. It is attractive especially for low-cost silicon materials like upgraded metallurgical grade (UMG) silicon, which usually contain 3d transition metals in high concentrations. Etching of silicon by HCl gas occurs during HCl gas gettering above a certain onset temperature. The etching rate as well as the gettering efficiency was experimentally determined as a function of the gettering temperature, using UMG silicon wafers. The activation energy of the etching reaction by HCl gas was calculated from the obtained data. The gettering efficiency was determined by analyzing Ni as a representativ…

Nanoscale Etching of GaAs and InP in Acidic H<sub>2</sub>O<sub>2</sub> Solution: A Striking Contrast in Kinetics and Surface …

2018

In this study of nanoscale etching for state-of-the-art device technology the importance of the nature of the surface oxide, is demonstrated for two III-V materials. Etching kinetics for GaAs and InP in acidic solutions of hydrogen peroxide are strikingly different. GaAs etches much faster, while the dependence of the etch rate on the H+ concentration differs markedly for the two semiconductors. Surface analysis techniques provided information on the surface composition after etching: strongly non-stoichiometric porous (hydr)oxides on GaAs and a thin stoichiometric oxide that forms a blocking layer on InP. Reaction schemes are provided that allow one to understand the results, in particular…

2017

Significant progress in nonlinear and ultrafast optics has recently opened new and exciting opportunities for terahertz (THz) science and technology, which require the development of reliable THz sources, detectors, and supporting devices. In this work, we demonstrate the first solid-state technique for the coherent detection of ultra-broadband THz pulses (0.1–10 THz), relying on the electric-field-induced second-harmonic generation in a thin layer of ultraviolet fused silica. The proposed CMOS-compatible devices, which can be realized with standard microfabrication techniques, allow us to perform ultra-broadband detection with a high dynamic range by employing probe laser powers and bias v…

Cleaning and retreatment protocol for a debonded ceramic restoration

2014

Objectives: The aim of this article is to propose a resin cement cleaning protocol for use before recementing a debonded restoration. Study Design: Ceramic samples were fabricated from IPS d.sign® and IPS e.max Press® and were treated with hydrofluoric acid etching (HF), or HF+silane (S), or HF+S+adhesive or HF+S+A+resin cement. All samples were placed in a furnace at 650º for one minute in order to attempt to pyrolyze the composite. Each step was examined under scanning electron microscopy (SEM). Results: When the cleaning protocol had been performed, it left a clean and retentive surface. Conclusions: If the restoration is placed in a furnace at 650º for one minute, the composite cement w…

Preparation of magnetron sputtered thin cerium oxide films with a large surface on silicon substrates using carbonaceous interlayers.

2013

The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show that the structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effec…

The application of porous silica layers in open tubular columns for liquid chromatography

1987

Two methods to realize a porous retentive silica layer on the inner wall of 10–25 µm fused silica capillaries for OTLC, etching and precipitation of silica from solution, have been investigated. Etching of the fused silica capillaries with 1M KOH, creates an activated surface, but the capacity of the silica layer is too small to serve as retentive layer in OTLC. Better prospects are offered by the precipitation of silica from a solution of polyethoxysiloxane, dynamically coated on the inner wall of the fused silica capillary. It appears to be possible to deposite a porous silica layer up to 0.8 µm thick (in a 25 µm capillary) by this method, which seems to be suitable for liquid-solid an dy…

Monitoring the Etching Process in LPFGs towards Development of Highly Sensitive Sensors

2017

Trabajo presentado en la Eurosensors 2017 Conference. París, 3–6 de septiembre de 2017. In this work, the monitoring of the etching process up to a diameter of 30 µm of two LPFG structures has been compared, one of them had initially 125 µm, whereas the second one had 80 µm. By tracking the wavelength shift of the resonance bands during the etching process it is possible to check the quality of etching process (the 80 µm fibre performs better than de 125 µm fibre), and to stop for a specific cladding mode coupling, which permits to obtain an improved sensitivity compared to the initial structure. This work was supported by the Spanish Agencia Estatal de Investigación (AEI) and Fondo Europeo…

Nanostructure Formation on ZnSe Crystal Surface by Electrochemical Etching

2021

The article describes a simple method for nanostructuring the surface of monocrystalline zinc selenide. It is shown that the traditional electrochemical etching of n-ZnSe (111) samples in a concentrated solution of nitric acid leads to the appearance of massive etching pits and small pores on the surface. The dynamics of the process and stages of crystal dissolution has been studied. It is assumed that the porous zinc selenide obtained in this way can be used in optoelectronic structures, as well as as buffer layers for growing zinc oxide.

Transfer of plasmid DNA into cells with microelectroporation arrays on a chip

2000

The possibility to transfer pure DNA into bacterial cells forms the basis for the genetic engineering of the cell. Electroporation is a powerful and easy technique to introduce plasmid DNA into cells. Its drawback for use with high-throughput approaches is that with standard electroporation chambers the reactions have to carried out one after the other and the electroporation cuvettes are expensive. To obtain the possibility of high-throughput electroporation reactions Escherichia coli cells were electroinjected in parallel with different plasmids in reactions as small as 100 nl on a microstructured array of electrodes, forming hundred separate electroporation units on a chip of a square in…

Development of micro chemical, biological and thermal systems in China: A review

2010

The interest in micro technologies for application in chemical, biological and thermal systems has increased considerably in China because microreactors or microfluidics in general demonstrate some remarkably advantages such as inherent miniaturization and portability, intensification of heat and mass transfer, quick analysis results, high-throughput and low consumption of reagents. This review focuses on the recent advances in the micro technologies in China including microreactor-based systems for chemical processing and analysis, biological microfluidics for DNA analysis, cell handling and analysis, separation based detection, protein based applications and immunoassays, micro heat trans…