Search results for "ohutkalvo"
showing 10 items of 65 documents
Structural and optical characterization of ZnS ultrathin films prepared by low-temperature ALD from diethylzinc and 1.5-pentanedithiol after various …
2019
The structural and optical evolution of the ZnS thin films prepared by atomic layer deposition (ALD) from the diethylzinc (DEZ) and 1,5-pentanedithiol (PDT) as zinc and sulfur precursors was studied. A deposited ZnS layer (of about 60 nm) is amorphous, with a significant S excess. After annealing, the stoichiometry improved for annealing temperatures &ge
Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition
2021
Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353) of the Academy of Finland. Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220 ) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353 ) of the Academy of Finland. Publisher Copyright: © 2021 The use of thin-films made by atomic layer deposition (ALD) is increasing in …
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
2016
The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual critical load criteria designed for scratch testing of coatings were not applicable to thin atomic layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points of the ALD coating. The adhesion performance of the ALD Al2O3, TiO2, TiN, and TaCN+Ru coatings with a thickness range between 20 and 600 nm and dep…
Polymorphic chiral squaraine crystallites in textured thin films
2020
Chirality 32(5), 619 - 631 (2020). doi:10.1002/chir.23213
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
2017
Atomic layer deposition (ALD) is a method for thin film fabrication with atomic level precision. This thesis focuses on low-temperature thermal and plasma- enhanced ALD and presents results on thin film growth by these techniques with examples of common ALD materials: Al2O3, ZnO and TiO2. As an example of limitations of the thermal ALD the nucleation and growth of Al2O3 and ZnO films on different grades of poly(methyl methacrylate) (PMMA) are presented, showing that the initiation of the growth is strongly dependent on both the deposited material and the substrate. A potential application of the ALD ZnO films in polymer surface functionalization is demonstrated by changing in the surface wettab…
Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
2020
The suitability of Ti as a band gap modifier for &alpha
Optical properties of conductive carbon-based nanomaterials
2016
The interaction of light with carbon nanomaterials is the main focus of this thesis. I explore several nanostructured systems involving different allotropes of carbon, and characterize them both electrically, if applicable, and optically. Special attention is paid to search for plasmon-like excitations on the systems, or utilizing surface plasmons on characterization. The first objective is to achieve control of carbon nanotube (CNT) conductivity with surface plasmon polaritons (SPPs), which resulted in the first CNT field-effect transistor (FET) that can be gated definitively with SPPs. The second objective is the investigation of optical properties of various thin carbon-based molecular n…
Tuning of Emission Wavelength of CaS:Eu by Addition of Oxygen Using Atomic Layer Deposition
2021
| openaire: EC/H2020/820423/EU//S2QUIP | openaire: EC/H2020/834742/EU//ATOP | openaire: EC/H2020/965124/EU//FEMTOCHIP Atomic layer deposition (ALD) technology has unlocked new ways of manipulating the growth of inorganic materials. The fine control at the atomic level allowed by ALD technology creates the perfect conditions for the inclusion of new cationic or anionic elements of the already-known materials. Consequently, novel material characteristics may arise with new functions for applications. This is especially relevant for inorganic luminescent materials where slight changes in the vicinity of the luminescent centers may originate new emission properties. Here, we studied the lumines…
Coupling the Higgs mode and ferromagnetic resonance in spin-split superconductors with Rashba spin-orbit coupling
2022
We show that the Higgs mode of superconductors can couple with spin dynamics in the presence of a static spin-splitting field and Rashba spin-orbit coupling. The Higgs-spin coupling dramatically modifies the spin susceptibility near the superconducting critical temperature and consequently enhances the spin pumping effect in a ferromagnetic insulator/superconductor bilayer system. We show that this effect can be detected by measuring the magnon transmission rate and the magnon-induced voltage generated by the inverse spin Hall effect.
Thin film conductivity measurements of carbon nanotube hemicellulose complex
2014
Työssä mitattiin hiilinanoputkista ja hemiselluloosasta koostuvan läpinäkyvän ohutkalvon sähkönjohtavuutta. Materiaali on Nemcel Oy:n kehittämä. Valmistimme useita näytteitä erilaisia mittauksia varten ja testataksemme eri valmistusmenetelmiä. Valmistetun ohutkalvon merkittävimmät ominaisuudet ovat läpinäkyvyys ja hyvä sähkönjohtavuus. Valmistetut kalvot olivat pääasiassa läpinäkyviä, mikä edellytti kalvon ohuutta. Itse materiaali toimitettiin vesiliuoksena, jossa oli 1:1 hiilinanoputkia ja hemiselluloosaa. Kalvot valmistettiin joko spinnaamalla tai kuivattamalla yksittäisiä pisaroita pinnalle. Näytteet valmistettiin pintaoksidioidulle piille, johon oli tehty kultaelektrodit. Kalvoa kuvatti…