Search results for "photoemission electron"

showing 10 items of 55 documents

Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode

2007

We report on recent developments of an "at wavelength" full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nut wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first, results obtained from a six inches mask blank prototype as prerequisite for industrial usage. (c) 2007 Elsevier B.V. All rights reserved.

Materials sciencebusiness.industryphotoemission electronExtreme ultraviolet lithographydefect analysisPhase (waves)Surfaces and InterfacesCondensed Matter PhysicsBlankSurfaces Coatings and Filmslaw.inventionStanding waveextreme ultraviolet lithography (EUVL)WavelengthPhotoemission electron microscopyOpticslawmultilayer mask blanksMaterials ChemistryOptoelectronicsEUV-PEEMPhotolithographybusinessLithographymicroscopy (PEEM)
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A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy

2006

Extreme ultraviolet lithography (EUVL) at 13.5 nm is the next generation lithography technique capable of printing sub-50 nm structures. With decreasing feature sizes to be printed, the requirements for the lithography mask also become more stringent in terms of defect sizes and densities that are still acceptable and the development of lithography optics has to go along with the development of new mask defect inspection techniques that are fast and offer high resolution (preferable in the range of the minimum feature size) at the same time. We report on the development and experimental results of a new 'at wavelength' full-field imaging technique for defect inspection of multilayer mask bl…

Materials sciencephotoemission electronbusiness.industryExtreme ultraviolet lithographyCondensed Matter Physicsmultilayer mask blankAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionPhotoemission electron microscopyWavelengthOpticslawEUV lithographymicroscopyOptoelectronicsX-ray lithographyElectrical and Electronic EngineeringPhotolithographyactinic defect inspectionbusinessLithographyImage resolutionNext-generation lithographyMicroelectronic Engineering
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Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy

2008

A photoemission electron microscope based on a new contrast mechanism "interference contrast" is applied to characterize extreme ultraviolet lithography mask blank defects. Inspection results show that positioning of interference destructive condition (node of standing wave field) on surface of multilayer in the local region of a phase defect is necessary to obtain best visibility of the defect on mask blank. A comparative experiment reveals superiority of the interference contrast photoemission electron microscope (Extreme UV illumination) over a topographic contrast one (UV illumination with Hg discharge lamp) in detecting extreme ultraviolet mask blank phase defects. A depth-resolved det…

Optics and PhotonicsMaterials scienceLightUltraviolet Raysbusiness.industryMicroscopy UltravioletExtreme ultraviolet lithographyEquipment DesignBlankDark field microscopyAtomic and Molecular Physics and Opticslaw.inventionMicroscopy ElectronPhotoemission electron microscopyWavelengthOpticslawExtreme ultravioletMicroscopyOptoelectronicsMicroscopy InterferencePhotolithographybusinessOptics Express
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Spin structure and spin Hall magnetoresistance of epitaxial thin films of the insulating non-collinear antiferromagnet SmFeO 3

2019

We report a combined study of imaging the antiferromagnetic (AFM) spin structure and measuring the spin Hall magnetoresistance (SMR) in epitaxial thin films of the insulating non-collinear antiferromagnet SmFeO3. X-ray magnetic linear dichroism photoemission electron microscopy measurements reveal that the AFM spins of the SmFeO3(1 1 0) align in the plane of the film. Angularly dependent magnetoresistance measurements show that SmFeO3/Ta bilayers exhibit a positive SMR, in contrast to the negative SMR expected in previously studied collinear AFMs. The SMR amplitude increases linearly with increasing external magnetic field at higher magnetic fields, suggesting that field-induced canting of …

OrthoferriteMaterials scienceMagnetoresistancetechnology industry and agricultureSpin structureCoercivityCondensed Matter PhysicsCondensed Matter::Materials ScienceMagnetizationPhotoemission electron microscopyAntiferromagnetismCondensed Matter::Strongly Correlated ElectronsGeneral Materials ScienceSpin-½
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Magnetization dynamics in polycrystalline Permalloy and epitaxial Co platelets observed by time-resolved photoemission electron microscopy

2009

We studied the dynamic magnetization response in rectangular polycrystalline Permalloy and also epitaxial Co structures (lateral sizes comprised tens of microns at a thickness of tens of nanometers) during the action of a magnetic field pulse, using time-resolved X-ray photoemission electron microscopy with a time resolution of 10 ps. In the case of Permalloy platelets the restoring torque that is necessary for the stroboscopic image acquisition is provided by the Landau flux closure structure representing a minimum of the free energy. We investigated the dynamic response of 90° Neel domain walls. The main results are: the maximum velocity of the domain wall is 1.5 × 104 m/s, the intrinsic …

PermalloyCondensed Matter::Materials SciencePhotoemission electron microscopyMagnetization dynamicsMagnetizationMagnetic anisotropyDomain wall (magnetism)Condensed matter physicsChemistryCondensed Matter PhysicsAnisotropyElectronic Optical and Magnetic MaterialsMagnetic fieldphysica status solidi (b)
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Sub-nanosecond resolution x-ray magnetic circular dichroism photoemission electron microscopy of magnetization processes in a permalloy ring

2005

Fast magnetization processes in a microstructured permalloy ring with 80 µm o.d. and 30 nm thickness have been observed by photoemission electron microscopy exploiting x-ray magnetic circular dichroism as the magnetic contrast mechanism. As a high speed probe we employed synchrotron radiation pulses at the ESRF (Grenoble) operated in 16-bunch mode, yielding photon pulses of 105 ps FWHM with a period of 176 ns. Fast magnetic field pulses have been generated by means of current pulses through coplanar waveguides with the magnetic structure being lithographically prepared on their surface. A stroboscopic pump–probe set-up with a variable time delay between the field pulse and photon pulse allo…

PermalloyMagnetic domainbusiness.industryMagnetic circular dichroismChemistrySynchrotron radiationCondensed Matter PhysicsMagnetic fieldMagnetizationPhotoemission electron microscopyOpticsX-ray magnetic circular dichroismGeneral Materials ScienceAtomic physicsbusinessJournal of Physics: Condensed Matter
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Time-resolved X-ray photoemission electron microscopy: imaging magnetodynamics on the 100 ps scale and below

2005

Abstract We present recent results of time-resolved X-ray photoemission electron microscopy (TR-XPEEM) investigations on magnetic systems. Our studies of microstructured permalloy particles employ a magnetic pump XPEEM probe approach. The stroboscopic experiments feature a time resolution of Δ τ ≤ 130  ps and yield magnetic domain images with a surprising richness of details. We observe a strong influence of incoherent magnetization rotation processes, which lead to complicated transient domain structures with a blocked relaxation behavior.

PermalloyMagnetization dynamicsRadiationMagnetic domainChemistryInverse photoemission spectroscopyAngle-resolved photoemission spectroscopyCondensed Matter PhysicsMolecular physicsAtomic and Molecular Physics and OpticsElectronic Optical and Magnetic Materialslaw.inventionMagnetizationPhotoemission electron microscopyNuclear magnetic resonancelawPhysical and Theoretical ChemistryElectron microscopeSpectroscopyJournal of Electron Spectroscopy and Related Phenomena
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Stroboscopic XMCD–PEEM imaging of standing and propagating spinwave modes in permalloy thin-film structures

2007

Abstract Using synchrotron-based stroboscopic photoemission electron microscopy with X-ray circular dichroism as contrast method, we have investigated the high-frequency response of permalloy thin-film structures. Standing precessional modes have been studied in rectangular elements (16 × 32 μm 2 , 10 nm thick) with a high time resolution of about 15 ps in the low- α mode of BESSY. With increasing amplitude of the applied magnetic AC field the particle is driven from an initial symmetric Landau flux-closure state into an asymmetric state and finally into a single-domain state magnetized perpendicular to the applied field H AC . The electromagnetic microwave field thus can induces a net magn…

PermalloyPhysicsCondensed matter physicsbusiness.industrySurfaces and InterfacesCondensed Matter PhysicsSynchrotronSurfaces Coatings and Filmslaw.inventionPhotoemission electron microscopyMagnetizationAmplitudeOpticslawMaterials ChemistryPerpendicularThin filmbusinessMicrowaveSurface Science
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Quantitative measurements of magnetic stray field dynamics of Permalloy particles in a photoemission electron microscopy

2010

By example of a Permalloy particle (40 × 40 μm(2) size, 30 nm thickness) we demonstrate a procedure to quantitatively investigate the dynamics of magnetic stray fields during ultrafast magnetization reversal. The measurements have been performed in a time-resolving photoemission electron microscope using the X-ray magnetic circular dichroism. In the particle under investigation, we have observed a flux-closure-dominated magnetic ground structure, minimizing the magnetic stray field outside the sample. A fast magnetic field pulse introduced changes in the micromagnetic structure accompanied with an incomplete flux closure. As a result, stray fields arise along the edges of domains, which cau…

PermalloyPhysicsPhotoemission electron microscopyHistologyDomain wall (magnetism)Condensed matter physicsMagnetic circular dichroismDemagnetizing fieldParticleUltrashort pulsePathology and Forensic MedicineMagnetic fieldJournal of Microscopy
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Direct observation of temperature dependent magnetic domain structure of the multiferroic La0.66Sr0.34MnO3/BiFeO3 bilayer system by x-ray linear dich…

2014

Low-thickness La0.66Sr0.34MnO3 (LSMO)/BiFeO3 (BFO) thin film samples deposited on SrTiO3 were imaged by high resolution x-ray microscopy at different temperatures. The ultra-thin thickness of the top layer allows to image both the ferromagnetic domain structure of LSMO and the multiferroic domain structure of the buried BFO layer, opening a path to a direct observation of coupling at the interface on a microscopic level. By comparing the domain size and structure of the BFO and LSMO, we observed that, in contrast to LSMO single layers, LSMO/BFO multilayers show a strong temperature dependence of the ferromagnetic domain structure of the LSMO. Particularly, at 40 K, a similar domain size for…

Photoemission electron microscopyExchange biasMaterials scienceFerromagnetismCondensed matter physicsX-ray magnetic circular dichroismMagnetic domainMagnetic circular dichroismGeneral Physics and AstronomyMultiferroicsDichroismJournal of Applied Physics
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