0000000000113481
AUTHOR
Konstantin M. Golant
Absorption and luminescence in amorphous SixGe1-xO2 films fabricated by SPCVD
Abstract Optical absorption and photoluminescence of Ge-doped silica films fabricated by the surface-plasma chemical vapor deposition (SPCVD) are studied in the 2–8 eV spectral band. The deposited on silica substrate films of about 10 μm in thickness are composed as x·GeO2-(1-x)·SiO2 with x ranging from 0.02 to 1. It is found that all as‐deposited films do not luminesce under the excitation by a KrF (5 eV) excimer laser, thus indicating lack of oxygen deficient centers (ODCs) in them. After subsequent fusion of silicon containing (x
Impact of fluorine admixture, hydrogen loading, and exposure to ArF excimer laser on photoluminescence of bismuth defects in amorphous silica
Abstract Photoluminescence (PL) excited by ArF (193 nm), KrF (248 nm) and N 2 (337 nm) pulsed lasers is studied in bismuth doped unfused silicon dioxide synthesized on silica substrates by surface-plasma chemical vapor deposition (SPCVD). Additive free and fluorinated (F content ~ 0.4 wt.%) amorphous silica are examined as host materials for bismuth. Three typical PL bands peaking at wavelengths of 650 nm (orange), 800 nm and 1400 nm (near infrared, NIR) were observed. It is found that fluorine additive weakly affects PL detail of as deposited samples. However, hydrogen loading completely deactivates NIR PL in the case of fluorine free sample, but only slightly suppresses the NIR band in fl…
Intra-center and recombination luminescence of bismuth defects in fused and unfused amorphous silica fabricated by SPCVD
Abstract Photoluminescence (PL) of bismuth doped silicon dioxide excited by UV excimer lasers (ArF — 193 nm, KrF — 248 nm) and a green light laser diode (532 nm) is studied in a wide spectral band at temperatures ranging from 12 to 750 K. Two types of samples are investigated: unfused, 100 μm in thickness amorphous layer immediately deposited on the inner surface of silica substrate tube, and the same material after profusion resulted from tube collapsing to a rod by external heating. PL bands centered at 620–650 nm, 820 nm and 1400 nm wavelengths are observed in both fused and unfused samples. Under excitation by the green laser diode decay time constants for 650 nm (orange) and 1400 nm (N…
Recombination luminescence of oxygen-deficient centers in silica
Abstract The luminescence of silica glass, prepared by plasma chemical vapor deposition (PCVD) and quartz glass of type IV (trade mark KS-4V) methods, were studied while irradiated with pulses of ArF laser (193 nm) light in the range of sample temperatures between 10 and 300 K. The samples contain less than 0.1 ppm metallic and hydroxyl impurities. The samples synthesized by PCVD were of two kinds. The first one (amorphous) was as-deposited from plasma at a substrate tube temperature of ∼1200 °C. The second one (fused) was prepared from the first by the tube collapsing with an external burner. In this process, a section of the substrate tube with the deposited glass was installed in a lathe…
Luminescence of unfused 95%SiO2–5%GeO2 amorphous films with fluorine additive: No evidence for presence of GeODC(I) defects found
Abstract Photoluminescence (PL) of unfused amorphous germanosilicate films with fluorine additive is studied in 2–8.5 eV spectral range. Experiments are based on films deposited on silica substrates by means of the surface-plasma chemical vapor deposition (SPCVD). Films of about 100 μm in thickness with “high F” (~ 4.2 wt.%) and “low F” (~ 0.5 wt.%) fluorine content have been fabricated for the experiments. KrF (248 nm), ArF (193 nm) and F2 (157 nm) excimer lasers are used to pump PL. It is found that absorption and luminescence associated with germanium oxygen deficient centers (GeODCs) in “high F” and “low F” films differ. In the “high F” unfused film absorption coefficient of the band at…