0000000000194800
AUTHOR
N.v. Sochinskii
Vapor growth of Hg1−xCdxI2 on glass using CdTe buffer
Abstract Vapor phase epitaxy (VPE) of Hg1−xCdxI2 layers on glass substrates covered by a CdTe buffer layer has been studied. The buffer layers of 2–4 μm thickness were formed by VPE using polycrystalline CdTe and Cd metal sources. The Hg1−xCdxI2 layers were grown using a (Hg1−yCdy)1−z(I2)z polycrystalline source, with a composition in the range of y=0.1–0.5 and z=0.5–0.8. Scanning electron microscopy and X-ray diffraction studies have shown that the composition and structure of Hg1−xCdxI2 layers depend strongly on the VPE conditions. Varying the growth time and source composition, it has been possible to obtain Hg1−xCdxI2 layers with the composition x in the range from approximately 0 (HgI2…
Vapor phase epitaxy of Hg1−xCdxI2 on sapphire
Abstract We demonstrate the possibility of growing Hg 1− x Cd x I 2 layers on sapphire substrates by vapor-phase epitaxy (VPE). The successful growth has been carried out using an α-HgI 2 polycrystalline source and a CdTe buffer layer grown on sapphire by metalorganic vapor phase epitaxy (MOVPE) before the Hg 1− x Cd x I 2 VPE growth. The Hg 1− x Cd x I 2 /sapphire 20–40 μm thick layers with a uniform composition in the range of x =0.2–0.6 were grown at 220–250°C for 70–300 h. The layers were studied by scanning electron microscopy, energy disperse X-ray analysis and X-ray diffractometry. Results on the layer characterization are reported and the effect of VPE conditions on the layer proper…
Selective area vapor-phase epitaxy and structural properties of Hg1 − xCdxTe on sapphire
Selective area (SA) Hg1 − xCdxTesapphire layers have been grown using the recently developed technique of the vapor-phase epitaxy (VPE) of Hg1 − xCdxTe layers on CdTesapphire heteroepitaxial substrates (HS), which we have called “VPE on HS technique” (Sochinskii et al., J. Crystal Growth 149 (1995) 35; 161 (1996) 195). First, planar CdTe (1 1 1) 5–7 μm thick layers were grown on sapphire (0 0 0 1) wafers by metalorganic vapor-phase epitaxy (MOVPE) at 340°C for 1–2.5 h using dimethylcadmium and di-isopropyltellurium as precursors. Second, CdTe/sapphire mesas were formed using standard photolithography in the form of alternating parallel linear arrays consisting of 500 × 70 μm2 elements. Thir…
Low-pressure synthesis and Bridgman growth of Hg1−xMnxTe
To reduce Hg high pressure related to the high-temperature synthesis reaction between the components in elemental form, Hg 1-x Mn x Te bulk crystals were produced by a two-step procedure including (I) the alloy synthesis using HgTe crystals grown by the cold travelling heater method and elemental Mn and Te to complete the desired composition, followed by (II) the Bridgman growth. The growth was carried out at temperature in the range of 700-850°C and rate of 1 mm/h. The Hg 1-x Mn x Te crystals have been characterised by X-ray diffractometry, energy dispersive X-ray analysis, Fourier transformed infrared spectroscopy and Hall effect techniques. Although the distribution coefficient of Mn was…