0000000000637319

AUTHOR

G. G. Scapellato

showing 3 related works from this author

Enhanced light scattering in Si nanostructures produced by pulsed laser irradiation

2013

An innovative method for Si nanostructures (NS) fabrication is proposed, through nanosecond laser irradiation (lambda = 532 nm) of thin Si film (120 nm) on quartz. Varying the laser energy fluences (425-1130 mJ/cm(2)) distinct morphologies of Si NS appear, going from interconnected structures to isolated clusters. Film breaking occurs through a laser-induced dewetting process. Raman scattering is enhanced in all the obtained Si NS, with the largest enhancement in interconnected Si structures, pointing out an increased trapping of light due to multiple scattering. The reported method is fast, scalable and cheap, and can be applied for light management in photovoltaics. (C) 2013 AIP Publishin…

Innovative methodMaterials sciencePhysics and Astronomy (miscellaneous)Settore ING-INF/01 - ElettronicaLight scatteringQuartz SiliconSettore FIS/03 - Fisica Della Materialaw.inventionsymbols.namesakeLight managementSi nanostructures NanostructurelawDewetting proceLaser energieDewettingThin filmbusiness.industryScatteringIsolated clusterLaserInterconnected structureSemiconductorsymbolsOptoelectronicsbusinessRaman spectroscopyPhotovoltaicRaman scattering
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Light absorption and conversion in solar cell based on Si:O alloy

2013

Thin film Si:O alloys have been grown by plasma enhanced chemical vapor deposition, as intrinsic or highly doped (1 to 5 at. % of B or P dopant) layers. UV-visible/near-infrared spectroscopy revealed a great dependence of the absorption coefficient and of the optical gap (Eg) on the dopant type and concentration, as Eg decreases from 2.1 to 1.9 eV, for the intrinsic or highly p-doped sample, respectively. Thermal annealing up to 400 °C induces a huge H out-diffusion which causes a dramatic absorption increase and a reduction of Eg, down to less than 1.8 eV. A prototypal solar cell has been fabricated using a 400 nm thick, p-i-n structure made of Si:O alloy embedded within flat transparent c…

Open circuit voltageSiliconAbsorption co-efficientMaterials scienceAnnealing (metallurgy)Analytical chemistryGeneral Physics and AstronomyPhotovoltaic effectChemical vapor depositionSettore ING-INF/01 - Elettronicalaw.inventionPlasma enhanced chemical vapor depositionOut-diffusionPlasma-enhanced chemical vapor depositionlawSolar cellDoping (additives)Thin filmAbsorption (electromagnetic radiation)Infrared spectroscopyElectrical analysiDopantDopingP-i-n structureDevice fabricationThermal-annealingSolar cells Silicon alloysPhotovoltaicTransparent conductive oxides Cerium alloyJournal of Applied Physics
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Laser irradiation of ZnO:Al/Ag/ZnO:Al multilayers for electrical isolation in thin film photovoltaics

2013

Laser irradiation of ZnO:Al/Ag/ZnO:Al transparent contacts is investigated for segmentation purposes. The quality of the irradiated areas has been experimentally evaluated by separation resistance measurements, and the results are complemented with a thermal model used for numerical simulations of the laser process. The presence of the Ag interlayer plays two key effects on the laser scribing process by increasing the maximum temperature reached in the structure and accelerating the cool down process. These evidences can promote the use of ultra-thin ZnO:Al/ Ag/ZnO:Al electrode in large-area products, such as for solar modules. © 2013 Crupi et al.; licensee Springer.

Materials scienceTransparent electrodesThin film photovoltaicNanochemistryNanotechnologyTransparent electrode AluminumSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionElectrical isolationIrradiated areaMaterials Science(all)PhotovoltaicslawTransparent electrodes ; Multilayers; Pulsed laser scribingMultilayerGeneral Materials ScienceIrradiationThin filmLaser scribingNano Expressbusiness.industryMaximum temperaturePulsed laser scribingCondensed Matter PhysicsLaserThin film photovoltaicsMultilayersElectrical isolationElectrodeOptoelectronicsResistance measurementLaser scribing proceZinc oxide Film preparationbusinessLaser scribing
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