6533b7d4fe1ef96bd126264f

RESEARCH PRODUCT

Optical emission fromSiO2-embedded silicon nanocrystals: A high-pressure Raman and photoluminescence study

Sergi HernándezJordi IbáñezJ. López-vidrierMargit ZachariasAlfredo SeguraB. GarridoJ. ValentaSebastian GutschDaniel Hiller

subject

Materials sciencePhotoluminescenceAnnealing (metallurgy)PhononHydrostatic pressureAnalytical chemistryNanotechnology02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter Physics01 natural sciencesPressure coefficientElectronic Optical and Magnetic Materialssymbols.namesakeNanocrystal0103 physical sciencessymbols010306 general physics0210 nano-technologyRaman spectroscopyRaman scattering

description

We investigate the optical properties of high-quality Si nanocrystals $(\mathrm{NCs})/\mathrm{Si}{\mathrm{O}}_{2}$ multilayers under high hydrostatic pressure with Raman scattering and photoluminescence (PL) measurements. The aim of our study is to shed light on the origin of the optical emission of the Si $\mathrm{NCs}/\mathrm{Si}{\mathrm{O}}_{2}$. The Si NCs were produced by chemical-vapor deposition of Si-rich oxynitride $(\mathrm{SRON})/\mathrm{Si}{\mathrm{O}}_{2}$ multilayers with 5- and 4-nm SRON layer thicknesses on fused silica substrates and subsequent annealing at 1150 \ifmmode^\circ\else\textdegree\fi{}C, which resulted in the precipitation of Si NCs with an average size of 4.1 and 3.3 nm, respectively. From the pressure dependence of the Raman spectra we extract a phonon pressure coefficient of $8.5\ifmmode\pm\else\textpm\fi{}0.3\phantom{\rule{0.16em}{0ex}}\mathrm{c}{\mathrm{m}}^{\ensuremath{-}1}/\mathrm{GPa}$ in both samples, notably higher than that of bulk $\mathrm{Si}\phantom{\rule{0.28em}{0ex}}(5.1\phantom{\rule{0.16em}{0ex}}\mathrm{c}{\mathrm{m}}^{\ensuremath{-}1}/\mathrm{GPa})$. This result is ascribed to a strong pressure amplification effect due to the larger compressibility of the $\mathrm{Si}{\mathrm{O}}_{2}$ matrix. In turn, the PL spectra exhibit two markedly different contributions: a higher-energy band that redshifts with pressure, and a lower-energy band which barely depends on pressure and which can be attributed to defect-related emission. The pressure coefficients of the higher-energy contribution are $(\ensuremath{-}27\ifmmode\pm\else\textpm\fi{}6)$ and $(\ensuremath{-}35\ifmmode\pm\else\textpm\fi{}8)\phantom{\rule{0.16em}{0ex}}\mathrm{meV}/\mathrm{GPa}$ for the Si NCs with a size of 4.1 and 3.3 nm, respectively. These values are sizably higher than those of bulk $\mathrm{Si}\phantom{\rule{0.28em}{0ex}}(\ensuremath{-}14\phantom{\rule{0.16em}{0ex}}\mathrm{meV}/\mathrm{GPa})$. When the pressure amplification effect observed by Raman scattering is incorporated into the analysis of the PL spectra, it can be concluded that the pressure behavior of the high-energy PL band is consistent with that of the indirect transition of Si and, therefore, with the quantum-confined model for the emission of the Si NCs.

https://doi.org/10.1103/physrevb.92.035432