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RESEARCH PRODUCT
Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation
Sulin ChengJussi TimonenRoope LehtoSomjai SangyuenyongpipatP. RahkilaMarkku VäisänenA.r. Ananda SagariHarry J. WhitlowMatti PutkonenTimo SajavaaraMikko LaitinenSergey Gorelicksubject
Nuclear and High Energy PhysicsMaterials scienceSiliconAnalytical chemistrychemistry.chemical_elementSubstrate (electronics)IonContact angleAtomic layer depositionchemistryAtomic ratioIrradiationThin filmInstrumentationdescription
Abstract Hydroxyapatite-like thin films on silicon substrate were deposited using atomic layer deposition and were subjected to irradiation with Ar ions accelerated through 0.6–1.2 kV as well as 2 MeV 16 O + ions. After low energy Ar irradiation a significant reduction in contact angle was observed. However, the Ca/P atomic ratio remained unchanged. No reduction in contact angle was seen for high energy 16 O + irradiation. Atomic force microscopy showed the enhancement of floral-like pattern after low energy Ar bombardment while high energy oxygen irradiation lead to raised islands on as-deposited films.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2008-05-01 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |