6533b7d6fe1ef96bd126646c
RESEARCH PRODUCT
Adhesion of proton beam written high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures on different metallic substrates
Harry J. WhitlowFrank WattF. ZhangJ.a. Van KanSergey Gorelicksubject
Nuclear and High Energy PhysicsNanostructureMaterials scienceProtonbusiness.industryNanotechnologyAdhesionPhotoresistProton beam writingchemistry.chemical_compoundchemistryResistOptoelectronicsbusinessInstrumentationHydrogen silsesquioxaneBeam (structure)description
Abstract Hydrogen silsesquioxane (HSQ) behaves as a negative resist under MeV proton beam exposure. HSQ is a high-resolution resist suitable for production of tall (
year | journal | country | edition | language |
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2009-10-01 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |