6533b7d6fe1ef96bd126646c

RESEARCH PRODUCT

Adhesion of proton beam written high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures on different metallic substrates

Harry J. WhitlowFrank WattF. ZhangJ.a. Van KanSergey Gorelick

subject

Nuclear and High Energy PhysicsNanostructureMaterials scienceProtonbusiness.industryNanotechnologyAdhesionPhotoresistProton beam writingchemistry.chemical_compoundchemistryResistOptoelectronicsbusinessInstrumentationHydrogen silsesquioxaneBeam (structure)

description

Abstract Hydrogen silsesquioxane (HSQ) behaves as a negative resist under MeV proton beam exposure. HSQ is a high-resolution resist suitable for production of tall (

https://doi.org/10.1016/j.nimb.2009.06.118