6533b7d7fe1ef96bd1267897

RESEARCH PRODUCT

Interface magnetization of ultrathin epitaxial Co2FeSi(110)/Al2O3films

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Element-specific magnetic properties of ultrathin epitaxial Co2FeSi(110) films were measured using x-ray magnetic circular dichroism (XMCD). The epitaxial Heusler films were grown by RF magnetron sputtering on substrates. The magnetization of thicker films as determined by XMCD is smaller than expected for a half-metallic material. In addition, the magnetization decreases considerably for films thinner than 10 nm. The thickness dependence of the magnetic moment can be described by introducing a certain number of dead layers representing a deficiency of magnetization at the interfaces. Quantitative evaluation results in a dead layer thickness of 0.8 nm at room temperature, consisting of a temperature induced size effect of 0.1 nm and a surface effect of 0.15 nm at the top and 0.55 nm at the bottom interface.