6533b7d9fe1ef96bd126c2bd
RESEARCH PRODUCT
Fabrication and characterization of small tunnel junctions through a thin dielectric membrane
A. AassimeAntti ManninenJukka P. Pekolasubject
Materials scienceFabricationPhysics and Astronomy (miscellaneous)business.industryCoulomb blockadePhysics::OpticsNanotechnologyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectPlanarTunnel junctionCondensed Matter::SuperconductivityOptoelectronicsbusinessElectrical impedanceQuantum tunnellingElectron-beam lithographyVoltagedescription
We show that a small tapered hole through a thin silicon nitride membrane provides a mask for tunnel junction structures. Our experiments imply, unlike in the conventional planar electron beam lithography, that tunnel junctions are well voltage biased in this structure with vanishingly small on-chip impedance. Our technique allows fabrication of double junctions, and even multijunction linear arrays, with small metallic islands in between.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 1998-10-19 |