6533b7ddfe1ef96bd1274720
RESEARCH PRODUCT
<title>Annealing of radiation defects in x-irradiated LiBaF<formula><inf><roman>3</roman></inf></formula></title>
Uldis RogulisP. KulisA. VeispalsI. TaleMaris SpringisValters Zirapssubject
ImpurityAnnealing (metallurgy)ChemistryVacancy defectActivation energyIrradiationAtomic physicsRadiationRecombinationIondescription
Results of the glow rate technique application for analysis of the activation energy of thermostimulated annealing of X-ray created F-type color centers in pure and containing oxygen centers LiBaF3 crystals are presented. It is shown that depending on the impurity composition two alternative mechanisms could be involved in the annealing of color centers. It is proposed that either the anion vacancy governed migration of F-centers resulting in recombination with complementary defects, or the thermal delocalization of radiation created fluorine (Fi) interstitials captured by anti-structure defects followed by recombination with all kinds of complementary F-type centers are responsible for the recombination of radiation defects above RT.© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
year | journal | country | edition | language |
---|---|---|---|---|
2003-08-08 | SPIE Proceedings |