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RESEARCH PRODUCT
Investigations of TiO2 films deposited by different techniques
M. LaubeO. AndersonC. R. OttermannU. JeschkowskiK. BangeR. Feilesubject
ChemistryIon platingMetals and AlloysAnalytical chemistryPhysics::OpticsSurfaces and InterfacesDip-coatingElectron spectroscopyElectron beam physical vapor depositionSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCondensed Matter::Materials Sciencesymbols.namesakeNuclear reaction analysisMaterials ChemistrysymbolsThin filmSpectroscopyRaman spectroscopydescription
High refractive TiO2 films deposited by reactive electron beam evaporation, reactive ion plating and dip coating have been characterized by optical spectroscopy, electron spectroscopy for chemical analysis, Rutherford backscattering spectroscopy, nuclear reaction analysis and Raman spectroscopy. The spectral refractive index n exhibits a strong dependence on the deposition conditions. These findings will be connected to variations in density, stoichiometry, hydrogen content (H2O) and binding structure of the layers. A strong correlation is found between optical quantities and microscopic properties of TiO2 films.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 1991-03-01 | Thin Solid Films |