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RESEARCH PRODUCT

Spin-resolved low-energy and hard x-ray photoelectron spectroscopy of off-stoichiometric Co2MnSi Heusler thin films exhibiting a record TMR

Hong-xi LiuMartin AeschlimannMotohiro SuzukiMirko CinchettiYusuke HondaRoman FetzerClaudia FelserSiham OuardiStanislav ChadovMasafumi YamamotoTetsuya UemuraBenjamin BalkeGerhard H. FecherShigenori Ueda

subject

Valence (chemistry)Materials scienceAcoustics and UltrasonicsCondensed matter physicsMagnetoresistanceFermi energyDichroismPhoton energyCondensed Matter PhysicsLinear dichroismSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCondensed Matter::Materials ScienceX-ray photoelectron spectroscopyCondensed Matter::Strongly Correlated ElectronsElectronic band structure

description

Half-metallic Co2MnSi-based Heusler compounds have attracted attention because they yield very high tunnelling magnetoresistance (TMR) ratios. Record TMR ratios of 1995% (at 4.2 K) are obtained from off-stoichiometric Co2MnSi-based magnetic tunnel junctions. This work reports on a combination of band structure calculations and spin-resolved and photon-polarisation-dependent photoelectron spectroscopy for off-stoichiometric Heusler thin films with the composition Co2Mn1.30Si0.84. Co and Mn are probed by magnetic dichroism in angle-resolved photoelectron spectroscopy at the 2p core level. In contrast to the delocalised Co 3d states, a pronounced localisation of the Mn 3d states is deduced from the corresponding 2p core level spectra. The valence states are investigated by linear dichroism using both hard x-ray and very-low-photon-energy excitation. When a very low photon energy is used for excitation, the valence bands exhibit a spin polarisation of about 30% at the Fermi energy. First principles calculations reveal that the low spin polarisation might be caused by a spin-flip process in the photoelectron final states.

https://doi.org/10.1088/0022-3727/48/16/164002