6533b821fe1ef96bd127b95e

RESEARCH PRODUCT

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

Patrick PhilippPablo OrúsJosé María De TeresaRosa Córdoba

subject

focused ion beamMaterials scienceIon beamlcsh:Mechanical engineering and machinery02 engineering and technologyReview01 natural sciencesFocused ion beamIoncircuit editelectrical contacts0103 physical sciencesfocused ion beam-induced depositionDeposition (phase transition)lcsh:TJ1-1570Electrical and Electronic EngineeringThin filmLithographyFocused ion beam-induced deposition010302 applied physicsFocused ion beamNanowiresbusiness.industryMechanical Engineering021001 nanoscience & nanotechnologyElectrical contactsfocused electron beam-induced depositionFocused electron beam-induced depositionthin filmsnanowiresControl and Systems EngineeringOptoelectronicslithographyErratum0210 nano-technologybusinessLayer (electronics)

description

This article belongs to the Special Issue Multi-Dimensional Direct-Write Nanofabrication.

yearjournalcountryeditionlanguage
2019-11-01Micromachines
10.3390/mi10120799http://europepmc.org/articles/PMC6952801