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RESEARCH PRODUCT
Structural, electrical and optical properties of zinc‐iridium oxide thin films deposited by DC reactive magnetron sputtering
Juris PuransJ. GabrusenoksA AzensR. KalendarevMartins ZubkinsKaspars Vilnissubject
Materials scienceAnalytical chemistrychemistry.chemical_elementCondensed Matter PhysicsAmorphous solidsymbols.namesakechemistrySputteringElectrical resistivity and conductivitysymbolsTransmittanceIridiumThin filmRaman spectroscopyWurtzite crystal structuredescription
ZnO-IrO2 thin films were deposited on glass by DC reactive magnetron sputtering at room tem-perature. Structural, electrical and optical properties were investigated as a function of iridium atomic concentra-tion in the films. XRD data shows that ZnO-IrO2 thin films are X-ray amorphous and Raman spectrum resembles the spectrum of IrO2, without any distinct features of wurtzite ZnO structure. The lowest film resistivity and the highest transmittance achieved in the present study were 1.4 × 10-3 Ωcm and 33% at 550 nm, respectively. However, resistivity and transmittance are inversely related to the iridium concentration in the films.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2014-05-07 | physica status solidi c |